Method for fabricating nanoscale column array GaN-based normal-structured light emitting diode
A light-emitting diode and gallium nitride-based technology, which is applied in the field of fabrication of nano-scale columnar positive structure gallium nitride light-emitting diode arrays, can solve the problems of poor control of the size and depth of roughening
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[0023] The key of the present invention is to adopt PS ball to make metal mask, protect the epitaxial layer structure below it from being corroded by photoelectrochemical method, remove SiO 2 layer, and then etched the epitaxial layer structure to n-GaN by wet etching, and finally formed a gallium nitride nano-pattern array covered by a metal mask, removed the metal mask, filled with silica gel, and obtained nano-pillars through traditional LED technology array of light-emitting diodes. The nano-array LED produced by this method can effectively improve the stress of the columnar light-emitting LED, enhance the internal quantum efficiency, and at the same time, effectively improve the light extraction efficiency due to its structural characteristics.
[0024] see figure 1 and refer to Figure 2 to Figure 5 As shown, the present invention provides a method for making a nanoscale columnar array gallium nitride-based positive structure light-emitting diode, including:
[0025] ...
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