Unlock instant, AI-driven research and patent intelligence for your innovation.

Method for fabricating nanoscale column array GaN-based normal-structured light emitting diode

A light-emitting diode and gallium nitride-based technology, which is applied in the field of fabrication of nano-scale columnar positive structure gallium nitride light-emitting diode arrays, can solve the problems of poor control of the size and depth of roughening

Active Publication Date: 2015-06-24
INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
View PDF4 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, general wet etching is not easy to control the size and depth of coarsening. Therefore, how to realize the size control of coarsening and develop to a finer size has become a major problem.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for fabricating nanoscale column array GaN-based normal-structured light emitting diode
  • Method for fabricating nanoscale column array GaN-based normal-structured light emitting diode
  • Method for fabricating nanoscale column array GaN-based normal-structured light emitting diode

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0023] The key of the present invention is to adopt PS ball to make metal mask, protect the epitaxial layer structure below it from being corroded by photoelectrochemical method, remove SiO 2 layer, and then etched the epitaxial layer structure to n-GaN by wet etching, and finally formed a gallium nitride nano-pattern array covered by a metal mask, removed the metal mask, filled with silica gel, and obtained nano-pillars through traditional LED technology array of light-emitting diodes. The nano-array LED produced by this method can effectively improve the stress of the columnar light-emitting LED, enhance the internal quantum efficiency, and at the same time, effectively improve the light extraction efficiency due to its structural characteristics.

[0024] see figure 1 and refer to Figure 2 to Figure 5 As shown, the present invention provides a method for making a nanoscale columnar array gallium nitride-based positive structure light-emitting diode, including:

[0025] ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
diameteraaaaaaaaaa
Login to View More

Abstract

The invention discloses a method for fabricating a nanoscale column array GaN-based normal-structured light emitting diode, which includes the steps of: sequentially growing n-type GaN layer, a quantum well layer and a p-type GaN layer on unintentionally doped GaN layers which are sequentially grown on a sapphire substrate; depositing a PS(Poly Styrene) crystal layer on the p-type GaN layer; depositing a SiO2 layer; firing under high temperature to obtain neat nanoscale pores at the position of the PS crystal layer; depositing a metal layer; etching off the SiO2 layer and the metal layer; etching downward on the p-type GaN layer to form nanoscale GaN column arrays; filling insulating material among the nanoscale GaN column arrays, removing part of the insulating material among the nanoscale GaN column arrays to expose the p-type GaN layers in the nanoscale GaN column arrays and form a nanoscale column LED(Light Emitting Diode) chip; plating a transparent conductive layer on the surface of the chip through vapor deposition; fabricating an N electrode board at one side of each nanoscale GaN column array, fabricating N metal electrodes on the N electrode boards, and fabricating P metal electrodes on the upsides of the nanoscale GaN column arrays; and scribing and encapsulating splinters to finish the preparation process.

Description

technical field [0001] The invention belongs to the technical field of semiconductors, in particular to a method for manufacturing a gallium nitride light-emitting diode array with a nanoscale columnar formal structure. Background technique [0002] GaN-based light-emitting diodes are widely used in indoor lighting, traffic lights, TVs, mobile phones, liquid crystal display backlights, street lights, etc. Among them, how to replace traditional lighting tools such as fluorescent lamps and incandescent lamps as a new generation of green light sources is It is the most promising research topic in its application. At present, the luminous efficiency of light-emitting diodes still needs to be further improved, which is determined by the internal quantum efficiency and light extraction efficiency. Among them, the internal quantum efficiency of the blue LED can reach more than 70%, so how to improve the light extraction efficiency is particularly critical. [0003] The factors af...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01L33/20H01L33/00
Inventor 程滟汪炼成刘志强伊晓燕王国宏
Owner INST OF SEMICONDUCTORS - CHINESE ACAD OF SCI
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More