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Gas phase chlorination method of dichlorosilane

A technology of dichlorodihydrogen silicon and hydrogen, applied in the direction of halogenated silicon compounds, halogenated silanes, etc., can solve the problems of difficult control, full of explosion, etc., and achieve the effect of avoiding explosive reactions

Active Publication Date: 2013-03-20
宁夏胜蓝化工环保科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The existing research and production practice on dichlorodihydrosilane shows that the mixed gas formed by dichlorodihydrosilane and oxidant such as air, oxygen, chlorine, etc. has a very wide explosion limit, and the flash point of dichlorodihydrosilane is -37°C, and because reaction (1) is a strong exothermic reaction, the reaction of using chlorine to chlorinate gaseous or liquid dichlorodihydrosilane into silicon tetrachloride becomes uncontrollable and full of danger of explosion, which is The reason why there is no report on the use of chlorine to chlorinate dichlorodihydrosilane to prepare silicon tetrachloride

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0015] The hydrogen gas with a purity of 99.9% and the chlorine gas with a purity of 99.6% enter the burner through their respective pipes. The flow rate of chlorine gas is 1 kmol / h, the flow rate of hydrogen gas is 1.05 kmol / h, and the excess hydrogen gas is 5%. After the hydrogen gas and chlorine gas form a stable burning flame Finally, slowly inject dichlorodihydrosilane gas (the molar content of nitrogen in the dichlorosilane is 0%, and the molar content of hydrogen chloride is 0.1%) in the hydrogen flow, and reduce the molar flow of hydrogen proportionally at the same time, when dichlorodihydrogen When the flow rate of silicon reaches 0.05kmol / h, and the flow rate of hydrogen reaches 0.95kmol / h, the respective flow rates are maintained, so that the combustion reaction can proceed stably. After 1h, the reaction product is analyzed by gas chromatography (gas chromatography is a carrier gas with helium, and TCD is a detector), and the analysis results are 2.5% silicon tetrach...

Embodiment 2

[0017] The hydrogen gas with a purity of 99.9% and the chlorine gas with a purity of 99.6% enter the burner through their respective pipes. The flow rate of chlorine gas is 1 kmol / h, the flow rate of hydrogen gas is 1.05 kmol / h, and the excess hydrogen gas is 5%. After the hydrogen gas and chlorine gas form a stable burning flame Finally, slowly inject dichlorodihydrosilane gas (the molar content of nitrogen in the dichlorosilane is 0%, and the molar content of hydrogen chloride is 0.1%) in the hydrogen flow, and reduce the molar flow of hydrogen proportionally at the same time, when dichlorodihydrogen When the flow rate of silicon reaches 0.45kmol / h, and the flow rate of hydrogen reaches 0.15kmol / h, the respective flow rates are maintained, so that the combustion reaction can proceed stably. After 1h, the reaction product is analyzed by gas chromatography (gas chromatography is a carrier gas with helium, and TCD is a detector), and the analysis results are 28.1% of silicon tet...

Embodiment 3

[0019] The hydrogen gas with a purity of 99.9% and the chlorine gas with a purity of 99.6% enter the burner through their respective pipes. The flow rate of chlorine gas is 1 kmol / h, and the flow rate of hydrogen gas is 1.1 kmol / h. The excess hydrogen gas is 10%. After the hydrogen gas and chlorine gas form a stable burning flame Finally, slowly inject dichlorodihydrosilane gas (the molar content of nitrogen in the dichlorosilane is 0%, and the molar content of hydrogen chloride is 0.1%) in the hydrogen flow, and reduce the molar flow of hydrogen proportionally at the same time, when dichlorodihydrogen When the silicon flow rate reaches 0.5kmol / h, and the hydrogen flow rate is 0.1kmol / h, the respective flow rates are maintained, so that the combustion reaction can proceed stably. After 1h, the reaction product is analyzed by gas chromatography (gas chromatography is a carrier gas with helium, and TCD is a detector), and the analysis results are 31.2% of silicon tetrachloride, 6...

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Abstract

The invention provides a method for chlorinating dichlorosilane, a byproduct of polysilicon, in a gas phase. The method is characterized by utilizing flames generated by stable combustions of hydrogen and chlorine as initial reaction space, pumping dichlorosilane into hydrogen stream or directly pumping dichlorosilane to the bottoms of hydrogen and chlorine flames, simultaneously reducing hydrogen flow in proportion, triggering dichlorosilane and chlorine to carry out stable gas phase combustion reaction by the hydrogen and chlorine flames and chlorinating dichlorosilane to silicon tetrachloride. For polysilicon factories, transforming dichlorosilane to silicon tetrachloride is one of the best ways to achieve dichlorosilane recycling.

Description

technical field [0001] The invention relates to a method for chlorinating dichlorodihydrogen silicon in the gas phase, and more specifically, to a method for preparing silicon tetrachloride by combustion and chlorination of polysilicon by-product dichloro dihydrogen silicon and chlorine in the gas phase. Background technique [0002] Dichlorodihydrosilane is an important by-product other than silicon tetrachloride in the polysilicon production process of the improved Siemens method. Some polysilicon manufacturers mix it with trichlorosilane in a certain ratio and send it to the reduction furnace for the growth of polysilicon, such as China Patent CN102642834A. However, the production practice shows that sending too much dichlorodihydrosilane into the reduction furnace will lead to a series of problems such as the deposition of silicon rods is not dense, and the silicon powder blocks the pipeline. Therefore, the method of using dichlorodihydrogen silicon in a certain proport...

Claims

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Application Information

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IPC IPC(8): C01B33/107
Inventor 沈俊赵燕
Owner 宁夏胜蓝化工环保科技有限公司