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123results about "Preparation from carboxylic acid halide" patented technology

Preparation process of benzoyl chloride

The invention discloses a preparation process of benzoyl chloride. The preparation process comprises the following steps of synthesis of benzotrichloride: carrying out temperature reaction on methylbenzene and chlorine under the catalytic action of a catalyst to synthetize a crude benzotrichloride product; synthesis of the benzoyl chloride: continuously stirring and heating the crude benzotrichloride product and benzoic acid to prepare a crude benzoyl chloride product after adding the catalyst; refining of the benzoyl chloride: carrying out reduced pressure distillation on the crude benzoyl chloride product to prepare a refined benzoyl chloride product; recovering benzoyl chloride raffinate, adding water to the benzoyl chloride raffinate which is subjected to the reduced pressure distillation, heating and stirring to transform the benzoyl chloride contained in the raffinate into the benzoic acid, cooling, then separating out benzoic acid. The preparation process disclosed by the invention is easy to safe to operate, effectively shortens the reaction time, achieves the purity of the prepared benzoyl chloride by 99.5%, reduces the environmental pollution by recycling residues, saves the resources, reduces the cost, meets the requirements of pharmaceutical chemicals and can carry out massive industrial production.
Owner:YIDU YOUYUAN IND CO LTD

Method for recycling trimethylacetic acid from pivaloyl chloride rectification raffinate

The invention provides a method for recycling trimethylacetic acid from pivaloyl chloride rectification raffinate. According to the technical scheme, the method has the experiment ideas that components and contents of pivaloyl chloride rectification raffinate are analyzed firstly on the basis of experiment means, on the basis, procedures such as hydrolysis, layering and rectification are confirmedaccording to chemical properties of pivaloyl chloride and trimethylacetic anhydride, and trimethylacetic acid is recycled. Specifically, the method comprises the following steps: firstly, adding a certain amount of pivaloyl chloride rectification raffinate, controlling specific temperature and pressure, adding a proper amount of water for hydrolysis reactions for multiple times to sequentially convert pivaloyl chloride and trimethylacetic anhydride into trimethylacetic acid, leaving to stand to layer water-containing phosphorous acid and a crude trimethylacetic acid product, feeding back thecrude trimethylacetic acid product to a trimethylacetic acid rectification procedure, and performing decoloring refining. By adopting the method provided by the invention, more than 90% of the pivaloyl chloride rectification raffinate can be converted into trimethylacetic acid, so that the utilization rates of raw materials are increased, the wastes are reduced, the environment protection burden of companies is alleviated, and meanwhile the production cost of products is effectively reduced.
Owner:山东民基新材料科技有限公司

Fluorine-containing polymer for photoresist, top anti-reflection film composition containing fluorine-containing polymer and application of fluorine-containing polymer in photoresist

The invention relates to a fluorine-containing polymer for photoresist, a top anti-reflection film composition containing the fluorine-containing polymer and application of the fluorine-containing polymer in the photoresist. The structural formula of the fluorine-containing polymer for the photoresist is CF2(CF3)CF2-[O-CF(CF3)CF2]n-O-CF(CF3)COO-R, wherein n is in a range of 1-8, and R is one or more selected from the group consisting of H, NH4 or other similar structures. On the basis of the weight of the whole polymer, the content a of a polymer component with n of no more than 1 is 0-12%; the content b of a polymer component with n of 2 is 55-80%; the content c of a polymer component with n of 3 is 15-30%; the content d of a polymer component with n of 4 is 0-15%; the content e of a polymer component with n of no less than 5 is 0-8%, wherein the sum of b and c is no less than 80%; and a, d and e are equal to 0 at the same time, or any one of a, d and e is equal to 0, or a, d and e are not equal to 0 at the same time. By controlling the content distribution of the polymer components with different molecular weights in the fluorine-containing polymer, the fluorine-containing polymer meeting specific composition requirements is obtained; and the fluorine-containing polymer is easy to degrade, low in toxicity and friendly to environment and can be used for preparing a top anti-reflection film with a low refractive index.
Owner:GANSU HUALONG SEMICON MATERIAL TECH CO LTD
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