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Diamond thick film prepared with direct-current plasma jet method

A diamond thick film, plasma technology, applied in metal material coating process, gaseous chemical plating, coating and other directions, can solve problems such as diamond tool restriction

Active Publication Date: 2015-01-07
HENAN FAMOUS DIAMOND IND CO LTD
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  • Description
  • Claims
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Problems solved by technology

This creates a great constraint on the size of the diamond tool

Method used

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  • Diamond thick film prepared with direct-current plasma jet method

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Embodiment Construction

[0019] The present invention will be further described in detail below in conjunction with examples, but the embodiments of the present invention are not limited thereto.

[0020] When producing thick diamond films, the following steps are used:

[0021] 1) Prepare the substrate: Mo is generally used as the substrate material;

[0022] 2) Substrate surface pretreatment: Use diamond powder to pre-grind or pre-sow seed crystals on the substrate surface. In particular, W20 diamond powder was used for pretreatment. ;

[0023] 3) Diamond deposition: 150 kW DC arc plasma spraying equipment is used to deposit diamond on the surface of the substrate, at a high temperature of 1180 ° C and 10 5 Under the high pressure of Pa, argon, hydrogen and methane are fully mixed according to the volume ratio of 10-20:5-9:1-6, and the diamond is deposited on the surface of the substrate at a flow rate of 20-40 l / min. The deposition rate of diamond is 0~20 microns / hour;

[0024] 4) Diamond surf...

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Abstract

The invention discloses a diamond thick film prepared with a direct-current plasma jet method. The diameter of the film is larger than 120mm, and the thickness of the film is larger than 1mm. The thick film is prepared with the production processes comprising specific steps that: a substrate is prepared; substrate surface pretreatment is carried out; diamond deposition is carried out, wherein diamond is deposited on the substrate surface by using a 150kW direct-current arc plasma jet device, wherein argon, hydrogen and methane are sufficiently mixed with a volume ratio of 10-20:5-9:1-6 under a high temperature of 1180 DEG C and a high atmospheric pressure of 105Pa, diamond is deposited on the substrate surface with a flow speed of 20-40l / min, and a diamond deposition speed is 0-20 micrometer / h; diamond surface treatment is carried out; diamond laser cutting is carried out; product inspection is carried out; and product packaging is carried out. With the technical scheme, the produced diamond thick film has stable quality, and uniform surface grain sizes. The film has no crack visible to naked eyes. The hardness, density, and light transmittance of the thick film are similar to those of natural diamonds.

Description

technical field [0001] The invention relates to a method for preparing a diamond thick film, in particular to a method for preparing a diamond thick film by DC plasma jetting. Background technique [0002] Diamond tools have the advantages of high work efficiency, long service life and good processing quality, and are currently mainly used for finishing. In recent years, due to the continuous improvement of production technology, the scope of use of diamond tools has been continuously expanded. In addition to being suitable for general finishing and semi-finishing, it can also be used for rough machining. Diamond tools are generally cut by diamond thick film, and the production level of diamond thick film directly affects the development of diamond tools. [0003] At present, there are large-diameter, long-channel DC arc plasma torches and semi-closed gas circulation technologies in China that use magnetron / hydrodynamic control to prepare diamond thick films, but the diamet...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C16/27C23C16/503C23C16/513
Inventor 李建林邹泽宏宫云霞
Owner HENAN FAMOUS DIAMOND IND CO LTD
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