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TIO2-containing quartz-glass substrate for an imprint mold and manufacturing method therefor

A technology of quartz glass and manufacturing method, which is applied in the direction of glass manufacturing equipment, manufacturing tools, glass molding, etc., can solve the problems of high thermal expansion coefficient and insufficient dimensional stability, and achieve the effect of suppressing the defects and position deviation of concave-convex patterns

Inactive Publication Date: 2013-03-27
ASAHI GLASS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the coefficient of thermal expansion of quartz glass around room temperature is as high as about 500ppb / °C, and the dimensional stability is insufficient.

Method used

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  • TIO2-containing quartz-glass substrate for an imprint mold and manufacturing method therefor
  • TIO2-containing quartz-glass substrate for an imprint mold and manufacturing method therefor
  • TIO2-containing quartz-glass substrate for an imprint mold and manufacturing method therefor

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0180] The following examples are given to illustrate the present invention, but the present invention is not limited to these examples.

[0181] Examples 1 and 2 are examples, and example 3 is a comparative example.

example 1

[0183] (Process (a))

[0184] TiCl used as a glass-forming raw material 4 and SiCl 4 TiO obtained by gasifying separately, mixing, and heating and hydrolyzing in an oxygen-hydrogen flame (flame hydrolysis) 2 -SiO 2 Glass particles are deposited on the deposition substrate and allowed to grow to form porous TiO 2 -SiO 2 vitreous body.

[0185] Porous TiO 2 -SiO 2 Since the glass body was difficult to handle directly, it was held in the air at 1200° C. for 4 hours in the state deposited on the deposition substrate, and then removed from the deposition substrate.

[0186] (Process (b))

[0187] The obtained porous TiO 2 -SiO 2 The glass body was kept at 1450 °C for 4 hours under reduced pressure to obtain TiO 2 -SiO 2 dense body.

[0188] (Process (c))

[0189] Will get TiO 2 -SiO 2 The dense body was put into a carbon mold and kept at 1680 °C for 4 hours, thus obtaining transparent TiO 2 -SiO 2 vitreous body.

[0190] (Process (d))

[0191] The resulting tran...

example 2

[0211] TiO 2 -SiO 2 The glass plate is rotated with the axis perpendicular to the main surface as the axis of rotation and is in contact with the rotating roller brush, thereby performing the TiO 2 -SiO 2 The side surface of the glass plate and the grinding of the chamfered surface were obtained in the same manner as in Example 1 except that TiO 2 -SiO 2 Glass substrate. The results are shown in Tables 1-3.

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Abstract

The disclosed TiO2-containing quartz-glass substrate for an imprint mold has a principal surface and a side surface. The arithmetic-mean roughness (Ra) of the side surface is 1 nm or less and the root mean square of the frequency roughness of the side surface between 10 [mu]m and 1 mm (MSFR_rms) is 10 nm or less.

Description

technical field [0001] The invention relates to TiO-containing materials for imprinting molds 2 Quartz glass substrate and its manufacturing method. Background technique [0002] As a method for forming semiconductor devices, optical waveguides, micro optical elements (diffraction gratings, etc.), biochips, microreactors, etc. The method of fine concave-convex pattern with a size of 1nm~10μm is to press an imprint mold with a reverse pattern (transfer pattern) of concave-convex pattern on the surface of a photo-curable resin layer formed on the substrate surface and make the photo-curable A photoimprint method in which a resin is cured to form a concavo-convex pattern on the surface of a substrate has attracted attention. [0003] Imprint molds used in photoimprinting are required to have light transmission, chemical resistance, and dimensional stability against temperature rise caused by light irradiation. As a base material for an imprint mold, quartz glass is often use...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B29C59/02C03C19/00B29C33/38C03B20/00C03C3/06C03C3/076
CPCC03B2201/075C03B2201/42C03C2204/08C03B19/1453B24B9/10C03C19/00G03F7/0002C03C2201/42C03C3/06C03B19/14Y10T428/24355B29C33/38B29C59/002B29C59/026B29D11/00769
Inventor 小池章夫宫坂顺子中西博志
Owner ASAHI GLASS CO LTD
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