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Photosensitive composition containing bifunctional benzophenone derivatives as photoinitiator

A technology of photosensitive composition and benzophenone, which is applied in the field of light curing, can solve the problems of poor deep curing performance, small molecular weight of benzophenone, short ultraviolet absorption wavelength, etc., and achieve high reactivity, simple preparation process, Effect of excellent surface and deep curing properties

Inactive Publication Date: 2013-04-24
HANGZHOU INST OF ADVANCED MATERIAL BEIJING UNIV OF CHEM TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] At present, among the many photoinitiators that have been successfully commercially produced, benzophenone has become one of the most widely used photoinitiators due to its low price and good surface curing performance, but due to the small molecular weight of benzophenone, Therefore, it has the disadvantages of easy to produce serious odor, short UV absorption wavelength and poor deep curing performance.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0018] A photosensitive composition comprising the following components:

[0019] (A) photoinitiator (structural formula (I)) 5g;

[0020] (B) Triethanolamine 3g;

[0021] (C) TPGDA 52g;

[0022] (D) 40g epoxy acrylic resin;

[0023] The preparation process of the composition is as follows: under the condition of yellow light, add (A), (B), (C) and (D) components into a glass flask equipped with stirring, and stir the materials at room temperature until they are uniform, and the present product is obtained. Invented photosensitive composition.

Embodiment 2

[0025] A photosensitive composition comprising the following components:

[0026] (A) photoinitiator (structural formula (I)) 3g;

[0027] (B) Triethanolamine 5g;

[0028] (C) TPGDA 52g;

[0029] (D) 40g epoxy acrylic resin;

[0030] The composition preparation process is the same as in Example 1.

Embodiment 3

[0032] A photosensitive composition comprising the following components:

[0033] (A) photoinitiator (structural formula (I)) 5g;

[0034] (B) Triethanolamine 3g;

[0035] (C) TPGDA 42g;

[0036] (D) 50g epoxy acrylic resin;

[0037] The composition preparation process is the same as in Example 1.

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PUM

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Abstract

The invention relates to a photosensitive composition and an application thereof in light-cured materials, belonging to the technical field of light curing. The photosensitive composition comprises 2-10 mass parts of a photoinitiator, 1-20 mass parts of an assisted photoinitiator, 10-80 mass parts of ethene unsaturated compound monomer and 10-80 mass parts of ethene unsaturated compound prepolymer. The photosensitive composition is relatively excellent in surface and deep curing properties, high in reaction activity and simple in preparation technology, does not produce unpleasant or pungent odor during a producing process, and can be widely used in fields of light-cured paint, printing ink, adhesives, photoresist, etc.

Description

technical field [0001] The invention relates to a photosensitive composition and its application in photocuring materials, belonging to the field of photocuring technology, in particular to a photosensitive composition containing bifunctional benzophenone derivatives as photoinitiators. Background technique [0002] UV curing technology has been widely used in coatings, inks, adhesives, photoresists and other fields. The photocurable composition in the UV curing system is mainly composed of three parts: monomer, prepolymer and photoinitiator. Among them, the photoinitiator is the most important factor affecting the photosensitive performance of the photocurable composition. When determining a photosensitive When formulating a polymer composition, finding a good photoinitiator is the key to technology. [0003] At present, among the many photoinitiators that have been successfully commercially produced, benzophenone has become one of the most widely used photoinitiators due ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/027G03F7/004
Inventor 胡春青宋国强李川
Owner HANGZHOU INST OF ADVANCED MATERIAL BEIJING UNIV OF CHEM TECH
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