Boron nitride comprising phosphonitrile structure and preparation method thereof
A hexagonal boron nitride and phosphazene-containing technology, which is applied in the treatment of dyed organic silicon compounds, dyed low-molecular organic compounds, and fibrous fillers, can solve the problems of flame retardancy and low thermal expansion coefficient, and achieve low thermal expansion coefficient, The effect of simple operation process and wide applicability
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Embodiment 1
[0024] in N 2 Under protection, 150 g of toluene and 3 g of hexagonal boron nitride were mixed in 1# reactor to obtain a uniform suspension. Add 0.15g of γ-aminopropyltriethoxysilane into the reactor, and then reflux at 100°C for 8h. After the reaction, filter with suction, wash with toluene and absolute ethanol for 5 times, and dry to obtain hexagonal boron nitride treated by coupling.
[0025] In the 2# reactor, 3 g of coupling-treated hexagonal boron nitride and 150 g of tetrahydrofuran were mixed to obtain a uniform suspension. 24g triethylamine is added into 2# reactor, under N 2 Under atmosphere and cooling with ice water, the reactant was stirred for 1.5 h. Dissolve 9g of chlorophosphazene in 50g of tetrahydrofuran, slowly add to 2# reactor within 1h, heat the 2# reactor, and make the material in the reactor react at 75°C for 8h. After the reaction, wash with tetrahydrofuran and absolute ethanol three times respectively, filter, remove the solvent, excess chlorophos...
Embodiment 2
[0045] in N 2 Under protection, 200g of toluene and 10g of hexagonal boron nitride were mixed in 1# reactor to obtain a uniform suspension. Add 0.50g of γ-aminopropyltrimethoxysilane into the reactor, and then reflux at 110°C for 12 hours; after the reaction, filter with suction, wash with toluene and absolute ethanol three times respectively, and dry to obtain the coupling treatment of hexagonal boron nitride.
[0046] In the 2# reactor, 5 g of coupling-treated hexagonal boron nitride and 200 g of tetrahydrofuran were mixed to obtain a uniform suspension. 25g triethylamine is added into 2# reactor, under N 2 Stir under atmosphere and ice water conditions for 2h. Dissolve 10g of chlorophosphazene in 100g of xylene, slowly add to 2# reactor within 2h, and then heat the 2# reactor, so that the material in the reactor should be kept at 80°C for 12h. After the reaction, wash with tetrahydrofuran and absolute ethanol three times respectively, filter, remove the solvent, excess ...
Embodiment 3
[0049] in N 2 Under protection, 200g of toluene and 3g of hexagonal boron nitride were mixed in 1# reactor to obtain a uniform suspension. Add 0.50 g of γ-aminopropyltriethoxysilane to the reactor, and then reflux at 100° C. for 8 h. After the reaction, filter with suction, wash with toluene and absolute ethanol three times respectively, and dry to obtain hexagonal boron nitride treated by coupling.
[0050] In the 2# reactor, mix 3g of coupling-treated hexagonal boron nitride with 100g of xylene and 50g of benzene to obtain a uniform suspension. 15g triethylamine is added into 2# reactor, under N 2 Under atmosphere and cooling with ice water, the reactant was stirred for 0.5h. Dissolve 8g of chlorophosphazene in a mixed solution of 25g of benzene and 50g of xylene, slowly add it to 2# reactor within 1.5h, then heat the 2# reactor, and make the material in the reactor react at 75°C for 8h. After the reaction, filter with suction, wash with benzene and absolute ethanol thre...
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