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Photosensitive resin composition for color filter and color filter including the same

A technology of photosensitive resin and color filter, applied in the field of photosensitive resin composition for color filter and color filter using the same, can solve problems such as multi-process, deterioration of yield and production efficiency, long time and the like

Active Publication Date: 2015-07-15
CHEIL IND INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, these conventional techniques have a problem of deteriorating yield and production efficiency since they require more processes and longer time

Method used

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  • Photosensitive resin composition for color filter and color filter including the same
  • Photosensitive resin composition for color filter and color filter including the same
  • Photosensitive resin composition for color filter and color filter including the same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1-5

[0154] Synthesis Examples 1-5: [Preparation of Base Polymer for Synthesis of Chemical Formula 1]

[0155] Combine 8 wt% of the total 2,2'-azobis(2,4-dimethylvaleronitrile) (2,2'-azobis(2,4-dimethylvalero nitrile)) (initiator) monomer and in Table 1 The monomers shown were introduced into a flask with a condenser and agitator in their respective weight ratios and propylene glycol monomethyl ether acetate (PGMEA, solvent) was added in 200 parts by weight based on 100 parts by weight total initiator and monomers , and then slowly stirred under nitrogen atmosphere. The reaction solution was heated to 80°C and stirred for 8 hours, and the aliphatic hydrocarbon-containing acrylic copolymer was polymerized. The obtained acrylic copolymer solution had a solids concentration of 34 wt%.

[0156] (Table 1)

[0157]

Embodiment 6-10

[0158] Synthesis Examples 6-10: [Copolymerization Reaction Between Copolymers Synthesized by Synthesis Examples 1-5 and Glycidyl Methacrylate]

[0159]100 parts by weight of each of the copolymers synthesized by Synthesis Examples 1 to 5 was introduced into a flask with a condenser and a stirrer and 10 parts by weight of glycidyl methacrylate (Japan NNOF Corporation) was added and heated under a nitrogen atmosphere. Stir slowly. A reaction solution was prepared by heating to 100°C and stirring for 18 hours. Table 2 below shows the reactants in parts by weight.

[0160] (Table 2)

[0161]

Embodiment 11-15

[0162] Synthesis Examples 11-15: [Copolymerization Reaction Between Copolymers Synthesized from Synthesis Examples 1-5 and Methacrylate-2-isocyanate]

[0163] 100 parts by weight of each of the copolymers synthesized by Synthesis Examples 6 to 10 was introduced into a flask with a condenser and a stirrer and 10 parts by weight of methacrylic acid-2-isocyanate (Showa Denko) was added and placed under a nitrogen atmosphere. Stir slowly. A reaction solution was prepared by heating to 50°C and stirring for 12 hours. Table 3 below shows the reactants in parts by weight.

[0164] (table 3)

[0165]

[0166] Preparation of photosensitive resin composition for color filter

[0167] [Example 1-5]

[0168] The photosensitive resin composition was prepared using the following components. First, the photopolymerization initiator was dissolved in a solvent and stirred at room temperature for 2 hours. Then, each of the acrylic copolymers and acrylic photopolymerizable monomers syn...

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Abstract

Disclosed is a photosensitive resin composition for a color filter that includes (A) an acrylic-based copolymer including a structural unit represented by the following Chemical Formula 1, wherein R1, R2, Q, and n are the same as defined in the specification; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; (D) a colorant; and (E) a solvent.

Description

[0001] Related applications [0002] This application claims priority to and the benefit of Korean Patent Application No. 10-2011-0128483 filed in the Korean Intellectual Property Office on December 2, 2011, the entire contents of which are incorporated herein by reference. technical field [0003] It relates to a photosensitive resin composition for a color filter (color filter) and a color filter using the same. Background technique [0004] Color filters are used for liquid crystal displays (LCDs), filters for cameras, and the like. It is fabricated by coating a charge coupled device or transparent substrate with fine areas colored with three or more colors. Pigmented films can generally be produced by dyeing, printing, electrophoretic deposition (EPD), pigment dispersion, and the like. [0005] Color filters are prepared through a number of chemical treatments during the manufacturing process. Since, in order to maintain the pattern formed under the above-mentioned co...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/027G03F7/004G02B5/20
CPCG03F7/0007G02B5/223G03F7/0388G03F7/027G02B5/20G02B5/201G03F7/004G03F7/0045G03F7/032
Inventor 李昌珉金光燮崔玄武白好贞田桓承
Owner CHEIL IND INC