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Device and method for generating extreme ultraviolet source based on radial polarization laser driving

A technology of extreme ultraviolet light source and generating device, which is applied in the field of laser application and can solve the problems of low EUV power

Inactive Publication Date: 2013-06-12
HUAZHONG UNIV OF SCI & TECH
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  • Abstract
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Problems solved by technology

[0008] Aiming at the defects of the prior art, the purpose of the present invention is to provide a method for generating an extreme ultraviolet light source based on radially polarized laser drive, aiming at solving the problem of low EUV power

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  • Device and method for generating extreme ultraviolet source based on radial polarization laser driving
  • Device and method for generating extreme ultraviolet source based on radial polarization laser driving
  • Device and method for generating extreme ultraviolet source based on radial polarization laser driving

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Embodiment Construction

[0024] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention.

[0025] The extreme ultraviolet light source generation device based on radially polarized laser drive provided by the embodiment of the present invention can be applied to a Sn plasma EUV light source, which can obtain higher laser-extreme ultraviolet conversion efficiency and promote the development of photolithography technology. The present invention is to common CO 2 Laser transformation produces radially polarized laser light, which can make the Sn target more excited to a high valence state. This method can obtain higher power EUV output, thereby improving lithography efficiency.

[0026] f...

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Abstract

The invention discloses a device and a method for generating an extreme ultraviolet source based on radial polarization laser driving. The device comprises a radial polarization pulse laser device, a laser amplifier, a collecting mirror and a drop generator. The radial polarization pulse laser device outputs radial polarization pulse laser, the laser amplifier amplifies the radial polarization pulse laser with low power and high repetition rate and outputs the radial polarization pulse laser with high repetition rate and high power, the radial polarization pulse laser with the high repetition rate and the high power is focused and illuminated on the drop, and generates extreme ultraviolet. According to the device and the method for generating the extreme ultraviolet source based on radial polarization laser driving, the beam is focused by utilizing the radial polarization pulse laser, the focus position has a longitudinal field component, energy carried by the longitudinal field component cannot be propagated, the energy is absorbed by Sn to be stimulated into ions in valence states, and extreme ultraviolet (EUV) of 13.5nm is effectively radiated. Meanwhile, the radial polarization pulse laser can obtain smaller focusing light spots during focusing, the smaller the light spots are, the higher the energy intensity of the laser is, and EUV radiation with stronger energy is generated.

Description

technical field [0001] The invention belongs to the field of laser applications, and more specifically relates to an extreme ultraviolet light source generation device and method based on radially polarized laser drive. Background technique [0002] With the continuous development of the semiconductor industry, the requirements for the integration of chips are getting higher and higher. The progress of semiconductor technology is determined by the lithography process. Extreme Ultraviolet (EUV) lithography will be the mainstream process of nanoscale lithography in the future. [0003] The wavelength of lithography light sources will reach 18nm in 2015, and the minimum feature size of lithography is proportional to the wavelength. Therefore, reducing the wavelength of lithography light sources is crucial to the reduction of lithography size. [0004] The performance indicators of lithography light sources proposed by international lithography machine suppliers are shown in Ta...

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Application Information

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IPC IPC(8): G03F7/20
Inventor 罗海鹏王新兵左都罗卢宏陆培祥
Owner HUAZHONG UNIV OF SCI & TECH
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