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Chemical polishing solution and preparation method thereof and method for chemically polishing Kovar parts

A chemical polishing and preparation method technology, applied in the field of metal surface treatment, can solve the problems of time-consuming and labor-consuming, low pass rate, unsatisfactory effect, etc., and achieve the effect of small impact and improved finish

Inactive Publication Date: 2013-10-23
HUADONG PHOTOELECTRIC TECHN INST OF ANHUI PROVINCE
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The effect is not ideal, and time-consuming and labor-intensive, the pass rate is not high

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0019] A chemical polishing liquid, its components and its volume are: 300 mL of nitric acid, 5 mL of hydrochloric acid, and 700 mL of acetic acid. The purity of nitric acid, hydrochloric acid, and acetic acid were analytically pure.

[0020] A preparation method of a chemical polishing liquid, the steps comprising:

[0021] A. Take nitric acid, hydrochloric acid and acetic acid according to the ratio, pour nitric acid and hydrochloric acid into the chemical polishing tank in turn, and stir carefully with a glass rod;

[0022] B. Add acetic acid to the mixed acid and stir to make the solution evenly mixed.

[0023] A method for chemical polishing of cutable pieces, the steps comprising:

[0024] a. Bind the parts with nickel wire, and fully degrease the cutting parts;

[0025] b. Pickling the cutting parts;

[0026] c. Put the cutting parts into the chemical polishing solution at a temperature of 75°C for 3 seconds, then wash them in running tap water for 30 seconds to cle...

Embodiment 2

[0032] A chemical polishing solution, its components and its volume are: 310 mL of nitric acid, 5.2 mL of hydrochloric acid, and 715 mL of acetic acid. The purity of nitric acid, hydrochloric acid, and acetic acid were analytically pure.

[0033] A preparation method of a chemical polishing liquid, the steps comprising:

[0034] A. Take nitric acid, hydrochloric acid and acetic acid according to the ratio, pour nitric acid and hydrochloric acid into the chemical polishing tank in turn, and stir carefully with a glass rod;

[0035] B. Add acetic acid to the mixed acid and stir to make the solution evenly mixed.

[0036] A method for chemical polishing of cutable pieces, the steps comprising:

[0037] a. Bind the parts with nickel wire, and fully degrease the cutting parts;

[0038] b. Pickling the cutting parts;

[0039] c. Put the cutting parts in the chemical polishing solution at a temperature of 73°C for 6 seconds, then wash them in running tap water for 30 seconds to c...

Embodiment 3

[0045] A chemical polishing liquid, its components and its volume are: 290 mL of nitric acid, 4.8 mL of hydrochloric acid, and 685 mL of acetic acid. The purity of nitric acid, hydrochloric acid, and acetic acid were analytically pure.

[0046] A preparation method of a chemical polishing liquid, the steps comprising:

[0047] A. Take nitric acid, hydrochloric acid and acetic acid according to the ratio, pour nitric acid and hydrochloric acid into the chemical polishing tank in turn, and stir carefully with a glass rod;

[0048] B. Add acetic acid to the mixed acid and stir to make the solution evenly mixed.

[0049] A method for chemical polishing of cutable pieces, the steps comprising:

[0050] a. Bind the parts with nickel wire, and fully degrease the cutting parts;

[0051] b. Pickling the cutting parts;

[0052] c. Put the cutting parts in the chemical polishing solution at a temperature of 77°C for 4 seconds, then wash them in running tap water for 30 seconds to cle...

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PUM

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Abstract

The invention discloses a chemical polishing solution and a preparation method thereof and a method for chemically polishing Kovar parts. The chemical polishing solution comprises the following components in parts by volume: 300+ / -10 parts of nitric acid, 5+ / -0.2 parts of hydrochloric acid and 700+ / -15 parts of acetic acid. The method for chemically polishing Kovar parts comprises the following steps of: removing oil of Kovar parts, acid pickling, chemical polishing solution and drying. An aluminum substrate is subjected to oil removal and acid pickling, and the Kovar parts are chemically polished; moreover, the time and labor are saved, the finish degree of the surface of the Kovar parts is greatly improved, burrs are completely removed, and the influence on the size of the Kovar parts is small.

Description

technical field [0001] The invention belongs to the technical field of metal surface treatment, and in particular relates to a chemical polishing liquid and a preparation method thereof, and a method for chemical polishing of cutting pieces. Background technique [0002] Due to the outstanding advantages of small size, light weight and high reliability, vacuum electronic devices play an increasingly important role in low-power modern weaponry. With the development of vacuum electronic devices, it is urgent to improve the smoothness and oxidation resistance of the substrate surface while removing the burrs on the surface. Kovar parts have a dense oxide film, are easy to weld and weld, have good plasticity, and can be cut and processed. They are widely used in the production of electric vacuum components and launch tubes. However, after spinning and wire-cutting processing of cutting parts, there are tiny curling and burrs on the surface of the jagged cutting parts, which are...

Claims

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Application Information

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IPC IPC(8): C23F3/00
Inventor 曹振玲苏靖马宁宁程国良雷宗涛高秀丽程海程奎
Owner HUADONG PHOTOELECTRIC TECHN INST OF ANHUI PROVINCE
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