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A chamfer measuring instrument

A measuring instrument and chamfering technology, which is applied in the direction of measuring devices, instruments, and optical devices, can solve the problems of affecting measurement accuracy, low measurement accuracy, and low measurement accuracy, and achieve the elimination of the impact of measurement results, high measurement efficiency, and The effect of high measurement accuracy

Active Publication Date: 2016-01-13
YUNSHENG HLDG GRP +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

When measuring the chamfering with the chamfering profile measuring instrument, firstly, the two vertical surfaces of the workpiece to be measured are close to the two positioning right-angle sides of the chamfering profile measuring instrument, and the probe of the measuring instrument is pushed back at the chamfering part to be measured. Take the data on the scale dial, and then correspond to the corresponding chamfering value; the chamfering profile measuring instrument is a contact measurement, during the measurement process, the sensor probe must be in contact with the surface of the workpiece chamfering part, due to the hardness of the sensor probe Very high, not suitable for measuring soft workpieces and small workpieces, and the measurement accuracy is not high due to human factors during the measurement process
When measuring the chamfering with the R gauge, use the chamfering part of the workpiece to be tested to stick to the R gauge with different R values, and observe the degree of adhesion between the workpiece and the R gauge. The R gauge test method is completely dependent on manual observation and judgment, and the measurement accuracy is low. low efficiency
When measuring chamfering with a microscope, place the chamfering part of the workpiece under the microscope, and read the distance between the edge of the chamfer and the edge of the workpiece through the microscope; however, the microscope has a small field of view and is only suitable for measuring workpieces with small chamfers, and The difference in artificial measurement and reading methods will also affect its measurement accuracy

Method used

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  • A chamfer measuring instrument
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  • A chamfer measuring instrument

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] Embodiment one: if image 3 As shown, a chamfer measuring instrument includes a workbench 1, a column 2 fixed on the workbench 1, a positioning device, a light source 4, a camera mechanism 5 and a data acquisition and processing device 6, and the positioning device includes a height adjustment mechanism installed on the The test platform 3 on the column 2, the light source 4 is a ring light source, the light source 4 is installed on the outer ring of the test platform 3, the test platform 3 is provided with a light-transmitting hole 31, and the camera mechanism 5 is fixedly installed on the bottom of the test platform 3. The light hole 31 is within the shooting range of the camera mechanism 5 , and the camera mechanism 5 is connected to the data acquisition and processing device 6 .

[0032] In this embodiment, the test platform 3 includes a bottom plate 32 and a shelf 33 arranged on the bottom plate 32, the light transmission hole 31 is arranged on the bottom plate, th...

Embodiment 2

[0035] Embodiment 2: This embodiment is basically the same as Embodiment 1, the only difference is that the light source 4 in this embodiment is a bar-shaped light source, and the test pointer 37 is a groove arranged on the bottom plate 32. Compared with Embodiment 1, the processing of this embodiment It is more difficult.

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Abstract

The invention discloses a chamfer testing method and a chamfer measuring instrument. Light horizontally irradiates a chamfer to be measured between two vertical surfaces and is reflected by 90 degrees to form a bright light strip; the width of the light strip is measured by acquiring an image of the bright light strip and corresponds to an R value of the chamfer to be measured. The chamfer testing method and the chamfer measuring instrument have the advantages that errors caused by a contact operation method are avoided by non-contact optical measurement of the R value of the chamfer to be measured, measuring results are obtained by processing data of the image, the influence of human factors on the measuring results is eliminated, measuring precision and measuring efficiency are high, and chamfers with any sizes can be measured.

Description

technical field [0001] The invention relates to a chamfering testing method and a measuring instrument, in particular to a testing method and a measuring instrument for measuring the chamfering between two vertical surfaces. Background technique [0002] As a parameter in the field of industrial design, chamfering can directly affect product performance whether its outline size is qualified or not. For example, in the field of magnetic materials, the size of the chamfer outline size ultimately affects the process characteristics of magnetic material products. If the chamfer is too small, the plating layer will appear on the chamfer after electroplating. would reduce its intended effectiveness. [0003] At present, most of the chamfering occurs between two vertical surfaces of the workpiece, and the measuring equipment for the chamfering contour size between the two vertical surfaces generally includes chamfering contour measuring instruments, R gauges and microscopes. When...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/255
Inventor 王刚许强徐小胜
Owner YUNSHENG HLDG GRP
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