Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Novel diazonaphthoquinone sulfonate derivative

A technology of diazonaphthoquinone sulfonate and derivatives of pimaric acid imide, which is applied in the field of new diazonaphthoquinone sulfonate derivatives, and can solve problems such as poor contrast and development tolerance, and limit practical applications

Inactive Publication Date: 2014-01-01
顾勇
View PDF1 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The sensitivity of the chemically amplified photosensitive imaging system composed of highly acidolytically active compounds and photoacid generators is much higher than that of the diazonaphthoquinone sulfonate system, but its contrast and development latitude are generally higher than those of the diazonaphthoquinone sulfonate system. Poor, which limits their practical application

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Novel diazonaphthoquinone sulfonate derivative
  • Novel diazonaphthoquinone sulfonate derivative
  • Novel diazonaphthoquinone sulfonate derivative

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0019] In the present invention, the parent compound N-hydroxymaleopimaric acid imide used can be prepared by the method described in our previous patent application (N-hydroxymaleopimaric acid imide sulfonate photoacid generator And its synthesis method, ZL: 200410039318.7), firstly obtained by reacting rosin with maleic anhydride and then reacting with hydroxylamine. Its structural formula is as follows:

[0020]

[0021] In the method of the present invention, the diazonaphthoquinone sulfonyl chloride used includes 2,1,4-diazonaphthoquinone sulfonyl chloride, 2,1,5-diazonaphthoquinone sulfonyl chloride or 2,1,6-diazonaphthalene sulfonyl chloride Quinone sulfonyl chloride. In terms of low price and easy availability, 2,1,4-diazonaphthoquinone sulfonyl chloride and 2,1,5-diazonaphthoquinone sulfonyl chloride are preferred, both of which are industrial products. Since 2,1,4-diazonaphthoquinone sulfonate has certain characteristics of generating acid after light exposure, which i...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a novel diazonaphthoquinone sulfonate derivative. The diazonaphthoquinone sulfonate derivative contains a protection group which can be decomposed by an acid, and can form a novel near-ultraviolet-band photosensitive imaging material together with a phenolic resin and the like, has the advantages of large contrast, good development latitude and high chemical amplification system sensitivity and the like of a diazonaphthoquinone sulfonate photosensitizer, and can be used a grand scale integrated circuit photoresist, and an imaging material of a printing high-sensitivity PS plate and computer-to-plate (CTP).

Description

Technical field [0001] The technical field of the present invention is the field of polymer photosensitive imaging materials, that is, a new type of naphthoquinone diazide sulfonate derivative, which contains an acid-decomposable protective group and is used in photoacid generators. In the presence of, the traditional photolysis of naphthoquinone diazide sulfonate occurs when exposed to light, and the photoacid generator also produces acid by light and causes acidolysis of the protective group, so it is also a chemically amplified sensitizer. If it is 2,1,4-diazonaphthoquinone sulfonate, it is not necessary to add a photoacid generator because of its photolysis and the property of generating acid by light. These diazonaphthoquinone sulfonate derivatives can be combined with phenolic resins to form photosensitive imaging materials in the near ultraviolet region, and can be used as photoresists for ultra-large-scale integrated circuits and high-sensitivity PS plates for printing a...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C07D405/12
CPCC07D405/12C07D209/70
Inventor 顾勇
Owner 顾勇
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com