Manufacturing method of OLED of double-face submicron order structure
A sub-micron-scale, manufacturing method technology, applied in the direction of organic light-emitting device manufacturing/processing, semiconductor/solid-state device manufacturing, organic light-emitting devices, etc., can solve difficult large-area preparation, high cost of quartz substrate patterning, and low light extraction efficiency and other problems to achieve the effect of improving the transmittance
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[0029] The present invention will be further described in detail below in conjunction with specific drawings and embodiments, which are explanations rather than limitations of the present invention.
[0030] Quartz substrate of the present invention has the manufacture method of the OLED device of double-sided submicron structure, comprises the following steps:
[0031] 1) Cleaning of quartz substrate
[0032] Clean the quartz substrate 2 with a detergent, put the quartz substrate 2 into acetone solution, ethanol solution, and deionized water in sequence, ultrasonically clean each for 5 to 15 minutes, and then place the quartz substrate on a hot plate to dry;
[0033] 2) if figure 1 As shown in a, the silicon dioxide ball 1 with a particle size of 400nm and the silicon dioxide ball 3 with a particle size of 200nm were spin-coated on both sides of a quartz substrate 2 by spin coating, and made into a single surface. Layer arrangement, due to the uneven particle size of the si...
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