Random positioning super-resolution microscopy method and device based on fluorescence emission suppression mechanism
A fluorescence emission and super-resolution technology, used in fluorescence/phosphorescence, material excitation analysis, etc., which can solve problems such as imperfection, damage to observed samples, and cumbersome sample processing.
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[0063] The present invention will be described in detail below in conjunction with the accompanying drawings, but the present invention is not limited thereto.
[0064] Such as figure 1 As shown, the randomly positioned super-resolution microscopy device based on the fluorescence emission suppression mechanism includes: a first laser light source 1, a second laser light source 2, a mirror 3, a first dichromatic mirror 4, a Kohler mirror group 5, a second two Color mirror 6, microscope objective lens 7, sample 8, optical filter 9, field lens 10, eyepiece 11, wide field photosensitive element 12 and computer 13.
[0065] In addition to the computer 13, the optical elements are arranged along the optical path direction, the first laser light source 1 and the first dichromatic mirror 4 are all located on the main axis optical path, and the second laser light source 2 converges with the first laser light source 1 on the first two through the reflector 3. On the color mirror 4 , th...
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