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Method for maintaining morphology of ADN (ammonium dinitramide) spherical particle

A technology of ammonium dinitramide and spheroidization, which is applied in the direction of gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of storage and propellant production process inconvenience, and achieve easy implementation and promotion, and simple operation , low-cost effect

Active Publication Date: 2014-03-26
XIAN MODERN CHEM RES INST
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This brings great inconvenience to ADN transportation, storage and propellant production process

Method used

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  • Method for maintaining morphology of ADN (ammonium dinitramide) spherical particle
  • Method for maintaining morphology of ADN (ammonium dinitramide) spherical particle
  • Method for maintaining morphology of ADN (ammonium dinitramide) spherical particle

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0047] This example provides a method for maintaining the structure and morphology of ammonium dinitramide (ADN) spheroidized particles. The method specifically includes the following steps:

[0048] Step 1: Place the ADN spheroidized particle sample in the reaction chamber of the vapor phase atomic layer deposition system, seal the reaction chamber, feed nitrogen gas into the vapor phase atomic layer deposition system and vacuumize it, adjust the flow rate of nitrogen gas to 80 sccm, and adjust the outlet valve of the reaction chamber so that The pressure in the chamber is controlled at 133Pa; and the sample temperature is kept at 55°C by heating;

[0049] Step 2: Perform atomic layer deposition on the ADN spheroidized particle sample to form a coating film. A cycle of atomic layer deposition growth includes the following four links:

[0050] (1) Inject the first reaction precursor trimethylaluminum (TMA) into the reaction chamber to make it undergo a saturated surface chemic...

Embodiment 2

[0063] This embodiment provides a method for maintaining the morphology of ADN spheroidized particles. This method is the same as in Embodiment 1, the only difference is that in step 3 of this embodiment, step 2 needs to be repeated for 400 cycles. Atomic layer deposition was carried out on the ADN spheroidized particles, and a coating film with a thickness of 45nm was formed on the surface of the ADN spheroidized particles, so that the coating film content was 0.1% of the total weight of the ADN spheroidized particles after coating, and the average film growth of the coating film The rate is 0.11 nm / cycle, and the shape of the ADN spheroidized particles is maintained by the coating film.

[0064] The ADN spheroidized particles treated with 400 cycles of ALD alumina coating in this example have no obvious change in the shape of the sample after being placed in humid air (temperature 23 °C, humidity 70%) for 48 hours, as shown in Figure 10 shown. Figure 9 It is the topograph...

Embodiment 3

[0072] This embodiment provides a method for maintaining the morphology of ADN spheroidized particles. This method is the same as in Embodiment 1, the only difference is that in step 3 of this embodiment, step 2 needs to be repeated for 800 cycles. Atomic layer deposition was carried out on the ADN spheroidized particles, and a coating film with a thickness of 90nm was formed on the surface of the ADN spheroidized particles, so that the coating film content was 0.2% of the total weight of the ADN spheroidized particles after coating, and the average film growth of the coating film The rate is 0.11 nm / cycle, and the shape of the ADN spheroidized particles is maintained by the coating film.

[0073] The morphology of the ADN spheroidized particles treated with 800 cycles of ALD alumina coating in this example did not change significantly after being placed in humid air (temperature 23°C, humidity 70%) for 48 hours.

[0074] It can be seen from the above examples 1 to 3 that the ...

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Abstract

The invention belongs to the field of energetic materials, and provides a method for maintaining the structure and morphology of an ADN (ammonium dinitramide) spherical particle. The method adopts an atomic layer deposition technology to cause two kinds of reaction precursors to alternately pass through a reaction chamber, and then the reaction precursors chemically react on the surface of the AND spherical particle to generate a cladding membrane. The cladding membrane completely covers the entire outer surface of the AND spherical particle, and the thickness can be precisely adjusted. When the thickness of the cladding membrane is controlled in the range of nanometer size, the content of cladding membrane is below 1 percent of the total mass of a system, and the influence on the energy characteristics of AND is small. In a moist environment, the cladding membrane plays a role of structural support in the AND spherical particle after absorbing moisture, so that the spherical particles cannot be dissolved or mutually fused. Through simple drying treatment, the AND spherical particle can remove water to restore the using state, and the structure and morphology and the physical and chemical properties of the AND spherical particle are not changed. The method is simple to operate, is low in cost, and facilitates industrial implementation and popularization.

Description

technical field [0001] The invention belongs to the field of energetic materials, and relates to a method for maintaining the shape of energetic material particles, in particular to a method for maintaining the shape of ammonium dinitramide spheroidized particles. Background technique [0002] Ammonium dinitramide (NH 4 N(NO 2 ) 2 , referred to as ADN) was first synthesized by Soviet scientists in the 1970s. ADN has the characteristics of high energy, high burning rate, and halogen-free. Using it to replace ammonium perchlorate (AP) or ammonium nitrate (AN) in solid propellants can greatly increase the energy of the propellant, reduce the characteristic signal, and reduce environmental pollution. pollute. Therefore, ADN is considered as one of the candidate oxidizers for a new generation of low-signature propellants. The ADN synthesized by the existing method is needle-like or flake-like. The ADN in this form has high mechanical sensitivity, is easy to absorb moisture, ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/44C23C16/455
Inventor 冯昊龚婷秦利军姬月萍
Owner XIAN MODERN CHEM RES INST
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