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Manufacturing method of heat sink with micro-nano structure array

A technology of micro-nano structure and manufacturing method, applied in the direction of nanotechnology, heat exchange equipment, lighting and heating equipment, etc., can solve the problems of small effective heat dissipation area, low material utilization rate, low heat dissipation efficiency, etc., and achieve strong designability , high material utilization rate, and the effect of improving heat dissipation efficiency

Active Publication Date: 2016-07-20
宁波微极电子科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] With the development of science and technology, the integration of integrated circuits is getting higher and higher, the volume of electronic products is getting smaller and smaller, and the requirements for heat sinks are also increasing. At present, heat sinks on the market are limited by processing technology and have a large volume. The disadvantages of low material utilization rate, small effective heat dissipation area and low heat dissipation efficiency

Method used

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  • Manufacturing method of heat sink with micro-nano structure array
  • Manufacturing method of heat sink with micro-nano structure array
  • Manufacturing method of heat sink with micro-nano structure array

Examples

Experimental program
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Effect test

Embodiment 1

[0026] 1) if figure 2 As shown, a mounting substrate 2 with a rectangular array of mounting holes is provided, the number of mounting holes 3 in the rectangular array of mounting holes is equal to N×M, and the N is the number of mounting holes 3 in each row of the rectangular array of mounting holes , the M is the number of mounting holes 3 in each column of the rectangular array of mounting holes, the N and M are integers between 3-500; the distance between adjacent mounting holes 3 in each row is D1, and each column The distance between adjacent mounting holes 3 is D2; the thickness of the mounting substrate 2 is 10 μm-5mm, and the mounting substrate 2 can be prepared by the prior art precision machining method or micro-electro-mechanical system (MEMS) processing , the D1 is n times of d1, and the D2 is m times of d2; N×M micro-electrolysis conduits 1 are provided, and the inner diameter of the micro-electrolysis conduit outlet 1.1 is 5nm-200μm; vertical in each installatio...

Embodiment 2

[0031] 1) combine Figure 1-Figure 5 As shown, prepare a micro-electrolysis catheter array template consisting of 3×3 (9) micro-electrolysis catheters. The specific preparation method is the same as that in Example 1. The micro-electrolysis catheter array is a rectangular array. The number is 3, the number of micro-electrolysis conduits in each column is 3, the distance between adjacent micro-electrolysis conduits in each row (the distance between the axes of adjacent micro-electrolysis conduits) is 15 μm, and the adjacent micro-electrolysis conduits in each column The distance between the electrolysis conduits (the distance between the axes of adjacent micro-electrolysis conduits) is 5 μm; the inner diameter of the micro-electrolysis conduit outlet 1.1 is 1 μm;

[0032] 2) Install the micro-electrolysis catheter array template prepared in step 1) on the micro-area electrolytic deposition system, and the micro-area electrodeposition system controls each micro-electrolysis cath...

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Abstract

A disclosed manufacture method for a micro-nano-structure array radiating fin comprises the following steps: 1) preparing a microelectrolysis conduit array template consisting of N*M microelectrolysis conduits; 2) controlling each microelectrolysis conduit, and completing the micro-nano-structure array skeleton consisting of (n*N)*(m*M) micro-nano metal columns on a conductive base plate; and 3)putting the micro-nano-structure array skeleton prepared in the step 2) in an electroplate liquid to electroplate with a porous nickel layer with the thickness of 1-5 mu m, so as to prepare the micro-nano-structure array radiating fin. According to the manufacture method, the material utilization rate is high, and the prepared radiating fin is large in effective heat radiation area and high in heat radiation efficiency.

Description

technical field [0001] The invention relates to the field of micro-nano material manufacturing, in particular to a method for manufacturing a micro-nano structure array heat sink. Background technique [0002] Micro-area electrolytic deposition technology is a micro-nano processing technology based on scanning probe technology (SPT). Its principle is to use a micro-electrolytic catheter with a diameter of micro-nano size as the electrolyte supply source to achieve micro-area electrochemical deposition growth. Micro-area electrolytic deposition system consists of computer and circuit amplifier, piezoelectric rod (or precision motor and drive shaft), micro-electrolytic catheter and electrolyte filled in micro-electrolytic catheter. The computer and the circuit amplifier provide and control three voltage outputs, and each voltage drives a piezoelectric rod (or precision motor), and changing the output value of the three voltages can make the three piezoelectric rods (or The mi...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C25D5/02C25D7/00C25D3/12F28F3/04B82Y40/00
Inventor 俞敏莉郑建红李立峰
Owner 宁波微极电子科技有限公司