Resonant type infrared detector structure capable of isolating packaging stress and manufacturing method thereof
An infrared detector and packaging stress technology, applied in the direction of microstructure devices composed of deformable elements, microstructure technology, microstructure devices, etc., can solve the problems of increasing response time and so on
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[0026] A resonant infrared detector capable of isolating packaging stress is manufactured by utilizing the technical scheme of the invention. Its micro-bridge resonator adopts polysilicon resistance electrothermal excitation and piezoresistive detection. Its production process is as follows:
[0027] (1) The original material is a double-sided polished silicon wafer of N-type, (100) plane, and resistivity 1-10Ω.cm. (see attached figure 2 (a))
[0028] (2) Thermally oxidize and grow a silicon dioxide film 7 with a thickness of 1 micron. (see attached figure 2 (b))
[0029] (3) A silicon nitride film 8 is deposited by a low-pressure chemical vapor deposition process (LPCVD), with a thickness of 0.3 microns. (see attached figure 2 (c))
[0030](4) Deposit a polysilicon film 9 with a thickness of 0.8 microns by a low-pressure chemical vapor deposition process (LPCVD). (see attached figure 2 (d))
[0031] (5) Ion implantation process Boron atoms are doped into the po...
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