Solar cell substrate, method for manufacturing same, and solar cell using same
A solar cell and substrate technology, applied in the field of solar cells, can solve problems such as inability to ensure the diffusion barrier effect, achieve excellent diffusion barrier effect, improve performance, and improve the effect of solar cell performance
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Embodiment 1
[0110] In order to examine the effect of a solar cell substrate with a multilayer metal diffusion barrier to hinder diffusion, a stainless steel (STS430) bottom substrate was prepared, and Cr was deposited on the stainless steel bottom substrate to a thickness of 100 nm to form the diffusion barrier of Comparative Example 1. . Afterwards, Mo was deposited onto the stainless steel bottom substrate to a thickness of 10 nm under the same conditions as in Comparative Example 1, and Cr was deposited again on the stainless steel bottom substrate on which Mo had been deposited to form a double layer of Mo / Cr. The metal diffusion barrier layer is used as Embodiment 1 of the present invention.
[0111] The deposition was performed by a sputtering method, and the deposition was performed by applying an electric power of 1200 W to the target under conditions of a pressure of 7 mTorr and a flow rate of Ar10 sccm.
[0112] The diffusion barrier layers prepared in Comparative Example 1 and...
Embodiment 2
[0116] In order to confirm the diffusion barrier effect of the multilayer structure, a diffusion barrier layer was formed as Comparative Example 2 by using a substrate made of stainless steel (STS430 material), and SiO 2 Deposited onto a stainless steel substrate to a thickness of 1000 nm. Then, Mo was deposited on the stainless steel substrate to a thickness of 60 nm under the same conditions as in Comparative Example 2, and SiO 2 Deposited onto a stainless steel substrate on which Mo has been deposited to a thickness of 1000 nm, thereby forming a SiO 2 The diffusion barrier layer formed by double layers of Mo / Mo is used as Example 2 of the present invention.
[0117] SiO 2 The deposition process is carried out by PECVD method, where SiO 2 The deposition of is carried out by applying a power of 200W under a pressure of 800mTorr and keeping N 2 O flow rate of 600 sccm, SiH 4 The flow rate was 45 seem and the Ar flow rate was 700 seem. Deposition of Mo was carried out by ...
Embodiment 3
[0122] In order to confirm the diffusion barrier effect of the multilayer structure including the oxide layer, the light conversion efficiency of solar cells with and without the oxide layer was measured. In Comparative Example 3 a conventional sodalime glass substrate was used. In Comparative Example 4, a substrate made of stainless steel (STS430 material) was prepared, and SiO was deposited on the stainless steel substrate. 2 To a thickness of 1000 nm, a diffusion barrier layer is formed. In addition, in Example 3 of the present invention, SiO is formed by the following method 2 / Diffusion barrier layer composed of a double layer of Mo: Mo was deposited on the stainless steel substrate to a thickness of 20 nm under the same conditions as the above stainless steel substrate, and SiO was deposited on the Mo deposited on the stainless steel substrate 2 to a thickness of 500nm. In addition, in Example 4 of the present invention, SiO is formed by the following method 2 / Mo / Si...
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Abstract
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