Bipolar pulse power supply used for generating low-temperature plasma

Abstract

The invention discloses a bipolar pulse power supply used for generating low-temperature plasma. The power supply is used for supplying power to a low-temperature plasma reactor generating low-temperature plasma and comprises a main circuit and a control circuit, wherein the main circuit is composed of a three-phase rectifier and filter circuit, an IGBT inverter and a boosted circuit, and the control circuit is composed of a single-chip microcomputer control circuit, an IGBT control circuit and an operation interface. According to the power supply, three-phase alternating voltage is converted into stable direct voltage through the rectifier and filter circuit, the direct voltage is converted into bipolar impulse voltage through the IGBT inverter, the bipolar impulse voltage is amplified through the boosted circuit, and electric energy is provided for the low-temperature plasma reactor; vibration loss of most energy in a system when traditional power supplies are used is effectively avoided, and as a result, energy injection of the reactor can be effectively improved, energy utilization efficiency can be improved, and electric consumption can be reduced.

Description

technical field [0001] The invention belongs to the technical field of power supplies, and in particular relates to a bipolar pulse power supply for generating low-temperature plasma. Background technique [0002] Low-temperature plasma plays an increasingly important role in the fields of microelectronics, material preparation, environmental protection, aerospace, military and other fields. In recent years, the research on low-temperature plasma has gradually become a research hotspot in plasma science. The power supply is the core and key part of the low-temperature plasma generator. At present, a variety of power sources have been applied to plasma generation, including DC power, AC power, and pulse power. [0003] Bipolar pulsed power supply has great advantages in generating low temperature plasma. The unipolar power supply will cause the charge to accumulate on the reactor. If it is not released, it will form a tail voltage, thereby enhancing the space electric field ...

AI Technical Summary

Problems solved by technology

The unipolar power supply will cause the charge to accumulate on the reactor. If it is not released, it will form a tail voltage, thereby enhancing the space electric field formed by the subsequent power supply pulse, causing intermittent spark discharge, which is not conducive to energy injection. At the same time, the current in the discharge space poor distribution

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