Production method of tribasic copper chloride
A production method and technology of copper chloride, applied in the direction of copper chloride, copper halide, etc., can solve the problems of strict crystallization conditions, product agglomeration, unstable crystal form of basic copper chloride, etc., and achieve the effect of high yield
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- Publication Date
- 2014-05-28
Smart Images
Figure 1 Figure 2 Figure 3
Abstract
Description
technical field
[0001] The invention relates to the field of etching waste liquid treatment, in particular to a production method of basic copper chloride. Background technique
[0002] Many copper additives in feed production are approved as trace additives, including copper sulfate, copper oxide, and basic copper chloride. In early feed production, copper sulfate and copper oxide were mostly used as trace additives, but due to the biological Low utilization rate, copper sulfate has strong oxidation-reduction properties in the feed mixture, which can easily cause the instability of the organic components required in the feed mixture. In recent years, it has low water solubility, low oxidation-reduction ability and bioavailability Basic copper chloride, which has the advantages of high efficiency, has gradually replaced copper sulfate and copper oxide as feed additives and is widely used.
[0003] As a new type of copper source feed additive, basic copper chloride has attra...
Examples
Embodiment 1
[0045] A kind of production method of basic cupric chloride, comprises the steps:
[0046] S1. Pretreatment: put 5m 3 Pour the acidic copper-containing etching waste liquid into the impurity removal reaction kettle, add 5 kg of sodium chloride under the condition of sufficient stirring, and stir for 10 minutes;
[0047] S2. Impurity removal: Add 5L hydrogen peroxide to the impurity removal reaction kettle, add sodium hydroxide to adjust its pH to 0.1 after 10 minutes of reaction, press filter after 20 minutes of reaction, and remove lead, arsenic, cadmium, mercury, iron and other impurities from the filtrate Enter the intermediate tank of acidic etching waste liquid;
[0048]S3. Continuous production: preheat the clean water to 30°C, and under the condition of a stirring speed of 20r / min, the volume flow ratio of the alkaline copper-containing etching waste liquid and the acidic copper-containing etching waste liquid after removal of impurities is 0.1:1, Control the pH betwe...
Embodiment 2
[0051] Except that sodium chloride is 400kg in S1, other conditions are with embodiment 1, and the appearance of the basic cupric chloride crystal prepared in embodiment 2 is brilliant green, and basic cupric chloride content (in terms of Cu 2 (OH) 3 Cl) is 98.6%, and the basic copper chloride X-ray diffraction figure that embodiment 2 makes is shown in figure 2 .
Embodiment 3
[0053] Except that sodium chloride is 250kg in S1, other conditions are the same as embodiment 1, and the appearance of the basic copper chloride crystal prepared by embodiment 3 is bright green, and the basic copper chloride content (in terms of Cu 2 (OH) 3 Cl) is 98.5%, and the basic copper chloride X-ray diffraction figure that embodiment 3 makes is shown in image 3 .