Apparatus for removing photoresist at edge of substrate
A technology of edge light and photoresist, which is applied in the direction of spraying device, spraying device, photosensitive material processing, etc., can solve the problems of photoresist dissolver blowing to the substrate, photoresist dissolver being resisted, splashing, etc. Achieve the effect of avoiding sputtering into the substrate, avoiding substrate defects, and reducing defective points
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[0033] In order to effectively prevent nozzle clogging, an embodiment of the present invention provides a photoresist removal device at the edge of a substrate. In this technical solution, due to the use of slit-shaped gas nozzles or slit-shaped liquid nozzles, compared with the existing needle-shaped nozzles, it is not easy to be clogged, and it is easier for gas or liquid to be ejected smoothly, and it will not cause the photoresist dissolving agent. The needle nozzle is blocked or deformed to cause sputtering, which avoids the occurrence of substrate defects caused by the sputtering of the photoresist dissolving agent inside the substrate. In order to make the objectives, technical solutions, and advantages of the present invention clearer, specific embodiments are given below to further describe the present invention in detail.
[0034] The embodiment of the present invention provides a device for removing photoresist at the edge of a substrate, such as figure 2 As shown, f...
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