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Non-water-based magnetorheological polishing solution and preparation method thereof

A magnetorheological polishing, non-water-based technology, applied in the field of magnetorheological polishing, can solve the problems that non-water-based magnetorheological polishing fluids have not been found, the rheological properties of magnetorheological fluids are not strong, and the processing range is limited. Achieve the effects of ensuring long-term stability, maintaining characteristic stability, and improving anti-settling and stability

Active Publication Date: 2014-09-03
NAT UNIV OF DEFENSE TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In the current magnetorheological polishing process, most of them use water-based magnetorheological polishing fluid. The base carrier fluid of this type of polishing fluid is water, so it is relatively easy to prepare low-viscosity, non-toxic, etc. suitable for magnetorheological polishing. However, the problems that water-based magnetorheological polishing fluids are generally difficult to solve are: easy to settle, easy to oxidize, and easy to agglomerate; in addition, because the base carrier fluid of water-based magnetorheological polishing fluid is water, its processing range is limited , not suitable for processing such parts with deliquescent characteristics such as KDP crystals
At present, magnetorheological fluids whose base carrier fluid is silicone oil are widely used in magnetorheological dampers, magnetorheological shock absorbers, and magnetorheological sealing devices. The main performance requirements of these instruments for magnetorheological fluids are long-term stability. , in order to solve the problem of sedimentation stability, silicone oil with high viscosity is generally used as the base carrier fluid, and the prepared magnetorheological fluid is silky; or nano-iron powder that is not easy to settle is selected, but the rheological poor performance
Both Chinese patent document CN1613919A and US patent document USP6824701 disclose oil-based magnetorheological fluids, but the main objects of use are dampers and shock absorbers and other equipment, and no non-water-based magnetorheological fluids for magnetorheological polishing have been found. Polishing fluid

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  • Non-water-based magnetorheological polishing solution and preparation method thereof

Examples

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Embodiment 1

[0033] A kind of non-aqueous magnetorheological polishing liquid of the present invention, by mass fraction, by 31% diethylene glycol monobutyl ether (alkoxy alcohol base carrier liquid), 59% carbonyl iron powder (magnetic sensitive particle ), 5% surfactant and 5% deionized water. The viscosity of the non-water-based magnetorheological polishing fluid at 20° C. is 0.5 Pa·s.

[0034] In this example, the viscosity of diethylene glycol monobutyl ether at 20° C. is 6.49 mPa·s.

[0035] In the present embodiment, the particle size distribution of carbonyl iron powder is as follows figure 1 As shown, the particle size is mainly in the range of 1 μm to 10 μm, the average particle size of carbonyl iron powder is 5 μm, the purity of Fe is greater than 97%, the relative quality factor is greater than 1.75, and the effective magnetic permeability is greater than 3. The carbonyl iron powder can be purchased in the market. .

[0036] In this embodiment, the surfactant is a mixture of st...

Embodiment 2

[0048] A kind of non-water-based magnetorheological polishing fluid of the present invention is substantially the same as the non-water-based magnetorheological polishing fluid of embodiment 1, the difference is only: by mass fraction, diethylene glycol monobutyl ether (base carrier liquid ) is 40%, carbonyl iron powder (magnetic sensitive particles) is 50%, surfactant is 5%, and deionized water is 5%.

[0049] A preparation method of the non-water-based magnetorheological polishing fluid of this embodiment, the preparation steps are basically the same as in Example 1, the difference is only that in terms of mass fraction, diethylene glycol monobutyl ether (base carrier liquid) is 40 %, carbonyl iron powder (magnetic sensitive particles) is 50%, surfactant is 5%, and deionized water is 5%.

[0050] As shown in Table 2, it is the viscosity and long-term stability test results of the non-water-based magnetorheological polishing fluid prepared in this embodiment. It can be seen ...

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Abstract

The invention discloses a non-water-based magnetorheological polishing solution and a preparation method thereof. The non-water-based magnetorheological polishing solution comprises the following components in percentage by mass: 30-60% of alkoxy alcohol, 30-60% of magnetic-sensitive particle, 3-8% of surfactant and 3-6% of deionized water. The preparation method comprises the following steps: (1) weighing the alkoxy alcohol, magnetic-sensitive particle, surfactant and deionized water; (2) heating the alkoxy alcohol, mixing with the surfactant to form a compound solution, and adding the magnetic-sensitive particle to obtain a mixed solution; and (3) pouring the mixed solution into a ball milling tank, carrying out ball milling, adding deionized water, and carrying out ball milling to obtain the non-water-based magnetorheological polishing solution. The non-water-based magnetorheological polishing solution has the advantages of low zero magnetic field viscosity, favorable rheological behavior, high long-term stability, no precipitation and no caking; and the preparation method is simple and convenient, and is low in cost.

Description

technical field [0001] The invention relates to magnetorheological polishing of deliquescent crystal optical elements, in particular to a low-viscosity stable non-water-based magnetorheological polishing liquid and a preparation method thereof. Background technique [0002] Magneto-rheological polishing technology (MRF) is a new type of optical processing method, which uses the rheological properties of magnetorheological polishing fluid in a magnetic field to polish workpieces, which can achieve deterministic removal of materials and sub-nanometer surface of the workpiece surface Roughness processing, the performance of magnetorheological polishing fluid is directly related to the effect of magnetorheological polishing, and is a key component of magnetorheological polishing technology. According to the processing characteristics of magnetorheological polishing technology, the main requirements for magnetorheological polishing fluid are: low zero magnetic field viscosity, ma...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C09G1/02
Inventor 彭小强石峰陈少山胡皓关朝亮戴一帆
Owner NAT UNIV OF DEFENSE TECH
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