Copper polishing agent and preparation method thereof

A polishing agent and corrosion inhibitor technology, used in the field of copper polishing agent and polishing agent, can solve the problems of incomplete cleaning, high labor intensity, low unit output, etc., and achieve stable polishing effect, good polishing effect, and improved brightness. Effect

Inactive Publication Date: 2014-09-17
WUZHOU HENGSHENG ELECTRONICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the existing polishing agents have problems such as quick rust return, narrow applicable metal types, and incomplete cleaning. Many polishing agents contain fluorine compounds or phosphorus-containing compounds, which pollute the environment.
Moreover, the commonly used polishing agents on the market are mainly solid, that is, polishing paste. This product is often operated intermittently in use, with high labor intensity, low unit output, and insufficient surface treatment for fine structures.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0016] A copper polishing agent provided by the present invention contains the following components per liter of copper polishing agent: 500 g of hydrogen peroxide, 10 g of disodium aminotriacetate, 60 g of diethylene glycol butyl ether, 80 g of citric acid, 8 g of acetyl monoethanolamine, and 40 g of benzyl alcohol .

[0017] The preparation method is as follows:

[0018] 1) each component is weighed by the above-mentioned mass number;

[0019] 2) Put the components weighed in step 1) into the reactor, add water to 1 L, and then stir at 50° C. for 50 minutes to obtain the copper polishing agent.

Embodiment 2

[0021] A copper polishing agent provided by the present invention contains the following components per liter of copper polishing agent: 200 g of hydrogen peroxide, 30 g of disodium aminotriacetate, 30 g of diethylene glycol butyl ether, 120 g of citric acid, 3 g of acetyl monoethanolamine, and 80 g of benzyl alcohol .

[0022] The preparation method is as follows:

[0023] 1) each component is weighed by the above-mentioned mass number;

[0024] 2) Put the components weighed in step 1) into the reactor, add water to 1 L, and then stir at 40° C. for 60 minutes to obtain the copper polishing agent.

Embodiment 3

[0026] A copper polishing agent provided by the present invention contains the following components per liter of copper polishing agent: 300 g of hydrogen peroxide, 30 g of disodium aminotriacetate, 30 g of diethylene glycol butyl ether, 100 g of citric acid, 38 g of acetyl monoethanolamine, and 50 g of benzyl alcohol .

[0027] The preparation method is as follows:

[0028] 1) each component is weighed by the above-mentioned mass number;

[0029] 2) Put the components weighed in step 1) into the reactor, add water to 1 L, and then stir at 45° C. for 40 minutes to obtain the copper polishing agent.

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PUM

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Abstract

The invention discloses a copper polishing agent and a preparation method thereof and belongs to the technical field of metal cleaning. According to the copper polishing agent and the preparation method thereof, disclosed by the invention, the copper polishing agent is stable in polishing effect and convenient in use. The copper polishing agent is characterized in that the copper polishing agent per liter contains the following ingredients by weight: 200-500g of hydrogen peroxide, 10-30g of amino disodium triacetate, 30-60g of diethylene glycol monobutyl ether, 80-120g of acid, 3-8g of a corrosion inhibitor, 40-80g of benzyl alcohol and the balance of water. The preparation method of the copper polishing agent comprises the steps: (1) weighing all the ingredients; (2) putting the ingredients weighed in the step (1) in a reaction vessel, adding water until the volume is 1L, and then, stirring for 20-60 minutes at the temperature of 40-50 DEG C, thereby obtaining the copper polishing agent.

Description

technical field [0001] The invention relates to a polishing agent, in particular to a copper polishing agent and belongs to the technical field of metal cleaning. Background technique [0002] Metal utensils usually have a layer of oil or other chemicals attached to the surface after they are processed. After a period of use, the corrosion of the environment will cause rust on the surface. For the sake of beauty and prolonging the service life, many metal parts need certain maintenance Brightness, polishing is an important part of parts processing. Polishing agents are often added during the polishing process to improve the brightness of metal parts and clean the metal surface. However, the existing polishing agents have problems such as quick rust return, narrow applicable metal types, and incomplete cleaning. Many polishing agents contain fluorine compounds or phosphorus-containing compounds, which pollute the environment. Moreover, the commonly used polishing agents on t...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23F3/06
Inventor 宋云
Owner WUZHOU HENGSHENG ELECTRONICS
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