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A flexible display substrate and its preparation method and display device

A flexible display and substrate technology, used in semiconductor/solid-state device manufacturing, electrical components, electrical solid-state devices, etc., can solve the problem of low transmittance of double amorphous silicon layers, adding a mask and etching process, and increasing process costs. and other problems, to achieve the effect of overcoming the reduction of transmittance, reducing the risk of local carbonization, and reducing production costs

Active Publication Date: 2017-11-10
BOE TECH GRP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, there are still some technical problems in the above-mentioned improved technical solution: 1. Adding a mask and etching process increases the process cost; 2. The double amorphous silicon layer (a-Si) has low transmittance and will be flexible and transparent in the future display problems

Method used

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  • A flexible display substrate and its preparation method and display device

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Embodiment 1

[0027] Embodiment 1 Flexible display substrate

[0028] Such as figure 1 As shown, the flexible display substrate described in this embodiment includes a substrate 1 , a flexible material layer 2 , a laser blocking layer 3 , and a display structure 4 .

[0029] Wherein: the substrate 1 is a glass substrate; the flexible material layer 2 is a polyimide film (PI film); the laser blocking layer is an indium gallium zinc oxide (IGZO) film; the thickness of the laser blocking layer 3 is

[0030] The preparation method of the above-mentioned flexible substrate is:

[0031] 1. Forming a flexible material layer 2 on the substrate 1;

[0032] 2. Forming a laser blocking layer 3 on the flexible material layer 2 by magnetron sputtering deposition;

[0033] 3. Forming a display structure 4 on the laser blocking layer 3;

[0034] The forming of the display structure includes: firstly forming an amorphous silicon layer on the laser blocking layer 3; then transforming the amorphous s...

Embodiment 2

[0037] Embodiment 2 Flexible display substrate

[0038] Compared with Embodiment 1, the present embodiment differs only in that the thickness of the laser blocking layer 3 is

Embodiment 3

[0039] Embodiment 3 Flexible display substrate

[0040] Compared with Embodiment 1, the present embodiment differs only in that the thickness of the laser blocking layer 3 is

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Abstract

The invention provides a flexible display substrate, a preparation method thereof, and a display device, which belong to the technical field of flexible display and can solve the problem of partial carbonization of a flexible material layer caused by laser light when the flexible display substrate is crystallized by ELA. The flexible display substrate of the present invention includes a flexible material layer and a display structure, and a laser blocking layer arranged between the flexible material layer and the display structure. The preparation method of the flexible display substrate of the present invention comprises: forming a flexible material layer on the substrate; forming a laser blocking layer on the flexible material layer; forming a display structure on the laser blocking layer; separating the flexible material layer from the substrate by laser lift-off , to obtain a flexible display substrate.

Description

technical field [0001] The invention relates to the technical field of flexible display, in particular to a flexible display substrate, a preparation method thereof, and a display device. Background technique [0002] Flexible display (Flexible Display) is a very promising display technology in the future. Under the development of a large number of researchers and engineers, the flexible display technology has developed rapidly. In the near future, the development of flexible display technology will make the display technology more diverse. At present, flexible organic light-emitting diodes (OLEDs) and flexible EPDs are being studied more, among which flexible OLEDs are the most researched. In order to drive OLEDs well, semiconductor materials with high mobility such as low-temperature polysilicon and oxides are currently used. However, in order to have better characteristics, it is generally difficult to lower the process temperature, which brings challenges to the selecti...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L27/32H01L51/52H01L51/56
CPCH10K71/00H10K77/111
Inventor 任庆荣郭炜马凯葓
Owner BOE TECH GRP CO LTD