Single black and white ccd phase shift dual wavelength interferometry method based on specific phase shift
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- SOUTH CHINA NORMAL UNIVERSITY
- Publication Date
- 2017-08-25
- Estimated Expiration
- Not applicable · inactive patent
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Abstract
Description
technical field
[0001] The invention relates to the fields of optical interferometry and digital holographic measurement, in particular to a single-black-and-white CCD phase-shift dual-wavelength interferometry method based on a specific phase shift. Background technique
[0002] Dual-wavelength interferometry is an optical interferometry technique in which two light sources of different wavelengths are used to record the interferogram of the same object, and after measuring the wrapping phase of the object at two single wavelengths, combined with the dual-wavelength phase The unwrapping technology obtains the synthetic wavelength and phase information, so as to truly reflect the three-dimensional shape of the object. Dual-wavelength interferometry technology makes up for the shortcomings of single-wavelength interferometry that cannot obtain correct results when the phase jump between adjacent points is greater than half the measurement wavelength, and expands the range of ...