Window film core functional layer and method for manufacturing window film core functional layer
A core function, window film technology, applied in the optical field, can solve the problems of no energy saving effect, light pollution, etc., and achieve the effect of meeting diversified needs, high production efficiency, and saving energy consumption
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Embodiment 1
[0031] Such as figure 1As shown, a core functional layer of a window film includes a PET base film 1 and a magnetron sputtering layer 2 disposed on the PET base film 1, and the magnetron sputtering layer 2 includes sequentially deposited from bottom to top The above-mentioned first transparent oxide layer 21 , first composite metal layer 22 , second transparent oxide layer 23 , second composite metal layer 24 and third transparent oxide layer 25 . The material of the first transparent oxide layer 21 , the second transparent oxide layer 23 and the third transparent oxide layer 25 is one of metal oxide, ITO or AZO.
[0032] Moreover, the first composite metal layer 22 includes a bottom-up first Ag layer 221 and a first seal metal layer 222; the second composite metal layer 24 includes a bottom-up second Ag layer 241 and The second sealing metal layer 242 . The material of the first sealing metal layer 222 and the second sealing metal layer 242 is Ti or NiCr alloy, the thicknes...
Embodiment 2
[0047] The power of the first chamber is controlled to be 30kW, so that the deposition thickness of the first transparent oxide layer 21 is 40nm.
[0048] Control the power of the second chamber to be 15kW, so that the deposition thickness of the first composite metal layer 22 is 20nm, wherein the deposition thickness of the first Ag layer 221 and the Ag layer 241 is 15nm, and the deposition thickness of the first Ag layer 221 is 15nm. The deposition thicknesses of the first metal layer 222 and the second sealing metal layer 242 are both 5 nm.
[0049] The power of the third chamber is controlled to be 30kW, so that the deposition thickness of the second transparent oxide layer 23 is 60nm.
[0050] Control the power supply of the fourth chamber to be 5kW, so that the deposition thickness of the second composite metal layer 24 is 20nm, wherein the deposition thickness of the Ag layer 221 is 15nm, and the deposition thickness of the sealing metal layer 222 is 5nm .
[0051] Co...
Embodiment 3
[0054] Control the power supply of the first chamber to 25kW, so that the deposition thickness of the first transparent oxide layer 21 is 35nm.
[0055] Control the power of the second chamber to be 10kW, so that the deposition thickness of the first composite metal layer 22 is 16.5nm, wherein the deposition thicknesses of the first Ag layer 221 and the first Ag layer 241 are both 12.5nm , the deposition thicknesses of the first sealing metal layer 222 and the second sealing metal layer 242 are both 4 nm.
[0056] Control the power supply of the third chamber to 25kW, so that the deposition thickness of the second transparent oxide layer 23 is 52.5nm.
[0057] Control the power of the fourth chamber to be 10kW, so that the deposition thickness of the second composite metal layer 24 is 16.5nm, wherein the deposition thickness of the Ag layer 221 is 12.5nm, and the deposition thickness of the sealing layer metal layer 222 4nm.
[0058] Control the power supply of the fifth cha...
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