Low-power dual-frequency ultrasonic/Fenton oxidation reactor device

An oxidation reactor and ultrasonic technology, applied in chemical instruments and methods, oxidized water/sewage treatment, special compound water treatment, etc., can solve the problems of uneven ultrasonic irradiation, low OH yield, etc. The effect of high stability, fast degradation rate and strong oxidative ability

Active Publication Date: 2015-02-04
CHONGQING UNIV
View PDF3 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The technical problem to be solved by the present invention is that in the existing ultrasonic / Fenton oxidation combined technology, the single-frequency ultrasonic irradiation in the same direction is not uniform, and the productive rate of OH is low.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Low-power dual-frequency ultrasonic/Fenton oxidation reactor device
  • Low-power dual-frequency ultrasonic/Fenton oxidation reactor device
  • Low-power dual-frequency ultrasonic/Fenton oxidation reactor device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] Such as figure 1 Shown: low-power dual-frequency ultrasonic Fenton oxidation reactor device, including dual-frequency ultrasonic generator 1, ultrasonic cleaning tank 2 and Fenton oxidation reactor 3; the dual-frequency ultrasonic generator can generate 40KHz and 20KHz high and low independently or simultaneously Ultrasonic waves of two frequencies; the ultrasonic cleaning tank is made of stainless steel, a vertical ultrasonic transducer 7 is arranged at the bottom of the cleaning tank, and a horizontal ultrasonic transducer 8 is arranged on the vertical wall of the cleaning tank, which is connected and controlled by the ultrasonic generator , the frequency matches the ultrasonic generator, the vertical transducer 7 receives ultrasonic signals with a frequency of 40KHz, and the horizontal transducer 8 receives ultrasonic signals with a frequency of 20KHz, and converts ultrasonic signals of different frequencies into mechanical energy and transmits them to the cleaning tank...

Embodiment 2

[0030] Embodiment 2 adopts the device of the present invention to treat waste water

[0031] Carry out oxidation treatment to chlorpyrifos pesticide waste water, the chemical oxygen demand of waste water is 5000mg / L; Waste water volume is 1L; Fenton reagent adds molar ratio (H 2 o 2 / Fe 2+ ) is 50:1, H 2 o 2 (30%) dosage is 2000mg / L (about 0.2% volume ratio), which is much lower than the dosage ratio of 1:1~10:1 of similar wastewater and the volume ratio of 0.5%~2% H 2 o 2 (30%) dosage; the air flow rate is 0.5L / min; the oxidation reaction time is 60min; when the reaction temperature is maintained at 23-25°C, the degradation rate of chemical oxygen demand in wastewater is 74%, which is much higher than that of similar wastewater 42 ~55% degradation rate, wastewater B / C increased from 0.18 to 0.64, biodegradability greatly improved.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention belongs to the technical field of degradation-resistant industrial wastewater treatment, and particularly relates to a method and a device for carrying out low-power dual-frequency ultrasonic irradiation / Fenton oxidation coupled treatment on industrial wastewater. The invention is designed for solving the technical problem that in an existing ultrasound / Fenton oxidation united technology, single-frequency ultrasonic irradiation of the same direction is non-uniform, and the yield of .H is low. The technical scheme of the invention is as follows: a low-power dual-frequency ultrasonic / Fenton oxidation reactor device comprises a dual-frequency ultrasonic generator, an ultrasonic cleaning tank and a Fenton oxidation reactor. The invention also provides a method for treating industrial wastewater by using the device. The device disclosed by the invention can be used for treating industrial wastewater, and has the advantages of low energy consumption, uniform ultrasonic irradiation, high utilization rate of Fenton reagents, high oxidative degradation rate of degradation-resistant organic pollutants, rapid degradation rate, and the like.

Description

technical field [0001] The invention belongs to the technical field of refractory industrial wastewater treatment, and in particular relates to a method and device for treating industrial wastewater by coupling Fenton oxidation with low-power dual-frequency ultrasonic irradiation. Background technique [0002] my country's economy is in a period of rapid growth, and the rapid development of industry is the guarantee of rapid economic growth, but a large amount of waste water is also produced during industrial production. Industrial wastewater often contains a large amount of refractory organic matter or toxic and harmful substances, which are difficult to treat with traditional methods. At present, the primary problem for this type of wastewater treatment is to efficiently remove refractory organic matter through physical and chemical pretreatment, and to improve its biodegradability to a certain extent. The research on physical and chemical treatment methods mainly focuses ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C02F1/36C02F1/72
CPCC02F1/36C02F1/722C02F2201/002C02F2305/026
Inventor 许晓毅程谣张婷婷蔡岚苏攀尤晓璐于兰幸秀丽
Owner CHONGQING UNIV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products