Manufacturing method for gold-plated circuit board
A manufacturing method and circuit board technology, which are applied in the directions of printed circuit manufacturing, printed circuit, and conductive pattern reinforcement, can solve the problems of burr energy and waste of gold-plated plates, and achieve the effects of improving etching efficiency, saving energy, and reducing burrs.
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specific Embodiment 1
[0044] A method for manufacturing a gold-plated circuit board, which sequentially includes cutting material, making inner layer graphics, pressing, drilling, milling grooves, first copper plating, first milling, second copper plating, second milling, internal Layer pattern etching, outer layer pattern making, pattern electroplating copper nickel gold, outer layer pattern etching, solder resist, surface treatment process, wherein, the thickness of copper in the first copper plating process is the same as that in the second copper plating process. Both the inner layer graphics and the outer layer graphics are made by dry film exposure and development.
[0045] The phenomenon points during the development account for 50% of the total length of the development, and the temperature during the development is 32°C.
[0046] Both the inner layer pattern etching and the outer layer pattern etching use acidic etching solution.
[0047] The acidic etching solution is copper chloride sol...
specific Embodiment 2
[0051] A method for manufacturing a gold-plated circuit board, which sequentially includes cutting material, making inner layer graphics, pressing, drilling, milling grooves, first copper plating, first milling, second copper plating, second milling, internal Layer pattern etching, outer layer pattern making, pattern electroplating copper nickel gold, outer layer pattern etching, solder resist, surface treatment process, wherein, the thickness of copper in the first copper plating process is the same as that in the second copper plating process. Both the inner layer graphics and the outer layer graphics are made by dry film exposure and development.
[0052] Both the inner layer graphics and the outer layer graphics are made by dry film exposure and development.
[0053]The phenomenon points during the development account for 70% of the total length of the development, and the temperature during the development is 28°C.
[0054] Both the inner layer pattern etching and the ou...
specific Embodiment 3
[0060] A method for manufacturing a gold-plated circuit board, which sequentially includes cutting material, making inner layer graphics, pressing, drilling, milling grooves, first copper plating, first milling, second copper plating, second milling, internal Layer pattern etching, outer layer pattern making, pattern electroplating copper-nickel-gold, outer pattern etching, solder resist, and surface treatment processes, wherein the thickness of copper in the first copper plating process is the same as that in the second copper plating process. Both the inner layer graphics and the outer layer graphics are made by dry film exposure and development.
[0061] Both the inner layer graphics and the outer layer graphics are made by dry film exposure and development.
[0062] The phenomenon points during the development account for 60% of the total length of the development, and the temperature during the development is 30°C.
[0063] Both the inner layer pattern etching and the ou...
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