Novel technology and equipment for preparing various functional and structural thin films at high speed

Abstract

The invention relates to equipment for preparing functional and structural thin films by using a spray-liquid atomizing-multielement eutectoid laser induced chemical vapor deposition method. According to the equipment, a liquid raw material supply system is introduced to replace a solid raw material heating tank which is used by the conventional chemical vapor deposition equipment, so that the problems that the conventional chemical vapor deposition method cannot provide accurate, stable and continuous raw material steam for a long time and the thin film components in the multielement thin film preparation process cannot be accurately controlled and the like can be effectively solved. On the basis, the reaction activation energy among vapor raw material molecules can be reduced to a great extent so as to improve the chemical reaction rate by adopting a method of laser radiation of a surface of a basal plate. Therefore, various oxides and non-oxidized thin films can be accurately, stably and continuously prepared on a large scale at the maximum rate.

Description

1. Technical Field: [0001] The invention is a technology and equipment for preparing thin films with various functions and structures by using a spray atomization-multiple eutectoid laser chemical vapor deposition method, and belongs to the technical field of surface processing and coating in new material technology. 2. Background technology: [0002] The chemical vapor deposition method has the advantages of simple preparation process, low cost, uniform deposition, and high product performance. Therefore, it has great practical prospects in large-scale production of films with various functions and structures. However, from the perspective of industrial application, the deposition rate using conventional chemical vapor deposition is still relatively low, resulting in relatively low production efficiency. Therefore, how to increase the deposition rate of the conventional chemical vapor deposition method has become an important consideration for improving production efficiency and...

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Problems solved by technology

[0004] The purpose of the present invention is to provide a new technology and equipment for high-speed preparation of various functional and structural thin films, so as to solve many problems in the large-scale preparation of various thin films by conventional chemical vapor deposition, so that large Accurate, stable and continuous preparation of various oxide and non-oxidized films on a large scale

[0005] Aiming at the problem that the deposition rate of the conventional chemical vapor deposition method is slow, the solution of the patent of the present invention is: by introducing the laser into the reaction chamber to irradiate the surface of the substrate, the activation energy of the reaction between the raw material molecules can be greatly reduced, so that it can be processed at a very high rate. Preparation of various oxide and non-oxide thin films

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