Manufacturing method of reverse conduction FS IGBT (field stop insulated gate bipolar transistor)
A bipolar transistor and reverse conduction technology, applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc., can solve problems such as increasing production costs
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[0019] In order to make the objects, features and advantages of the present invention more comprehensible, specific implementations of the present invention will be described in detail below in conjunction with the accompanying drawings.
[0020] figure 1 It is a flowchart of a method for preparing a reverse conduction field stop type insulated gate bipolar transistor in an embodiment, including the following steps:
[0021] S110, providing a silicon substrate of a first doping type.
[0022] Please refer to Figure 2A , in this embodiment, the silicon substrate of the first doping type is a P-type substrate 10 with a resistivity of 0.001˜100Ω*cm. Since part of the structure of the P-type substrate 10 will also serve as the backside P+ emitter region of the reverse conducting FS IGBT, there are corresponding requirements on its resistivity.
[0023] S120, forming multiple groove structures on one side of the silicon substrate by photolithography and etching.
[0024] Pleas...
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