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A tooling device for transferring graphene film

A graphene film and tooling technology, which is applied in the field of tooling devices for transferring graphene films, can solve problems such as low efficiency, and achieve the effects of easy manufacturing, improved production efficiency, and simple structure

Active Publication Date: 2017-05-10
CHONGQING GRAPHENE TECH +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, the traditional method of floating a piece of support layer on the surface of the etching solution is inefficient. In order to effectively improve the space utilization of the entire etching solution tank, a tooling device that can simultaneously etch multiple catalytic substrates is needed.

Method used

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  • A tooling device for transferring graphene film
  • A tooling device for transferring graphene film

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Embodiment Construction

[0022] figure 1 It is a schematic diagram of the three-dimensional structure of the tooling device for transferring graphene films of the present invention, figure 2 It is a schematic top view of the tooling device for transferring graphene films of the present invention, as shown in the figure: the tooling device for transferring graphene films of this embodiment includes a bottom plate 1, a fixing column 2 fixedly connected to the bottom plate, and a gasket 3; The spacer 3 can pass through the fixing column 2 to isolate the graphene film support layer.

[0023] The principle of the present invention is: first perforate at a specific position of the graphene film support layer, and pass through the hole on the support layer through the fixing post 2 fixedly connected to the bottom plate for fixing on the tooling device of the present invention. The graphene film support layer is separated by the spacer 3, so that the etching solution can flow between two adjacent graphene film ...

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Abstract

The invention discloses a tooling device for transferring a graphene thin film. The tooling device comprises a bottom plate, a fixed column and a washer, wherein the fixed column is fixedly connected with the bottom plate; the washer can penetrate through the fixed column and is used for isolating a graphene thin film supporting layer. A plurality of catalysis substrates on which the graphene thin films grow can be simultaneously etched through the tooling device, the production efficiency is improved, and the tool device has the advantages of being simple in structure, and easy to manufacture.

Description

Technical field [0001] The invention relates to a tooling device, in particular to a tooling device for transferring graphene films. Background technique [0002] Graphene is a carbon atom by sp 2 The hybrid orbitals form a monoatomic layer flat film with a hexagonal lattice. As a new type of semiconductor material, it has the characteristics of high light transmittance and high conductivity. The chemical vapor deposition method prepares graphene by using carbon-containing compounds such as methane as a carbon source, and graphene is obtained by pyrolysis and growth of the carbon source on the surface of a catalytic substrate. The catalytic substrate is generally made of copper, nickel, platinum and other transition metal elements. Since the copper substrate exhibits unique "self-limiting growth" when preparing graphene by chemical vapor deposition, it is suitable for industrial large-scale preparation of single-layer graphite Olefin film. [0003] At present, the laboratory main...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B32/184
Inventor 钟达史浩飞邵丽张鹏飞余杰
Owner CHONGQING GRAPHENE TECH