Efficient broadband terahertz wave absorption device based on highly-doped silicon materials
A highly doped, silicon material technology, applied in the field of high-efficiency broadband terahertz wave absorbers, can solve the problems of large absolute value of the real part of the dielectric constant and cannot directly support surface plasmons, and achieve high-efficiency broadband absorption and processing methods. Diversified, simple and compact effects
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[0020] The following are specific embodiments of the present invention. The technical solutions of the present invention will be further described in conjunction with the accompanying drawings, but the present invention is not limited to these embodiments.
[0021] refer to figure 1 In this embodiment, a layer of silicon dioxide intermediate layer 2 with a thickness of t is superimposed on a highly doped silicon substrate layer 1 with a period of P, and a strip top layer 3 with a broadband of W and a thickness of h is superimposed on the upper layer to form three-layer structure. The terahertz beam is vertically incident on the structure. Since the substrate is opaque to the terahertz radiation, it can be seen that the absorptivity of the structure can be obtained directly from the reflection spectrum. Such a highly doped silicon-silicon dioxide-highly doped The silicon three-layer structure is similar to the metal-dielectric-metal structure in the optical band. At this time...
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