A device for installing and adjusting extreme ultraviolet reflective lenses

Abstract

The invention discloses a lens fitting and adjusting device, which is used for installing and adjusting a lens (2), which comprises a cavity (1), a lens support frame (3), a holding pressure system (4) and a supporting system (5). The bottom wall of the body has a through hole. The lens support frame is located in the cavity for supporting the lens. The holding pressure system is used to fix the lens on the lens support frame. The support system penetrates into the cavity through the through hole of the cavity. The part is fixedly connected with the bottom of the lens support frame. The supporting system includes an upper flange, a lower flange, a bellows and a supporting screw. The upper flange and the lower flange are respectively fixedly connected with the two ends of the bellows and aligned axially, and a through hole is opened in the center. The supporting screw passes through the through hole of the cavity and the through hole of the axis of the lower flange, the bellows and the upper flange in turn, and abuts against the bottom of the lens support frame. The invention can realize the three-dimensional adjustment of the lens and the lens support frame, and isolate the vibration influence of the vacuum pump group on the lens.

Description

technical field [0001] The invention belongs to the technical field of extreme ultraviolet (EUV) lithography, and in particular relates to a lens assembly and adjustment device, in particular to an EUV reflective lens assembly and adjustment device. Background technique [0002] EUV lithography technology is the next-generation lithography machine technology after 193nm immersion lithography technology. Since EUV radiation is strongly absorbed by almost all substances (including air), the EUV lithography machine system must be placed in a vacuum environment. The vacuum pump group is used to realize this vacuum environment, so that the chamber meets the vacuum degree requirements. [0003] In addition, the optical system of the EUV lithography machine is a reflective optical system. In a closed vacuum environment, in addition to requiring stable installation and reliable adjustment, it is also necessary to eliminate various external disturbances (such as the vibration of the ...

AI Technical Summary

Problems solved by technology

[0004] A damping bellows can be installed between the vacuum pump group and the vacuum chamber to reduce the vibration effect of the vacuum pump group on the vacuum chamber, thereby reducing the vibration effect on the mirror; Increasing the length of the bellows will increase the suction flow resistance and increase the loss of pumping speed, which will lead to the adverse results of the reduction of the effective pumping speed of the pump and the increase of the pumping time

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