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A kind of polishing powder preparation method for silicon nitride ceramic polishing

A silicon nitride ceramic and polishing powder technology, which is applied in the preparation of silicon nitride ceramic polishing powder and in the field of silicon nitride ceramic polishing, can solve the problem that the wear resistance does not meet the polishing requirements of silicon nitride ceramics, and achieves polishing The effect of improved friction hardness, low production cost and simple preparation process

Inactive Publication Date: 2017-04-19
UNIV OF JINAN
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Compounding of several oxides can overcome the above-mentioned deficiencies. Chinese patent application CN101362925B discloses a compound polishing powder for polishing optical elements and its preparation method and polishing process. It contains 0.5 to 3 parts of dichromium trioxide and 1.0 It is composed of aluminum oxide, but the wear resistance of this composite polishing powder cannot meet the polishing requirements of silicon nitride ceramics

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0024] A kind of preparation method of silicon nitride ceramic polishing powder, in reactor, add the cerium chloride of 9g respectively, the chromium trioxide of 32g, 3g sodium dodecylbenzene sulfonate is dissolved in water, then add the trioxide of 15g Dialuminum, 36g of boron nitride, stir to form a slurry, then dissolve 5g of oxalic acid in water and add, water is not included in the components, under normal pressure, stir, add heat at 85°C, react for 21h, and make cerium chloride form particles Uniform cerium oxalate, separated from solid and liquid, roasted at 1100°C for 6 hours, cooled, and crushed by air flow to obtain silicon nitride ceramic polishing powder, the particle size of the obtained silicon nitride ceramic polishing powder is in the range of 0.2-2.0 μm Inside.

Embodiment 2

[0026] A kind of preparation method of silicon nitride ceramic polishing powder, in reactor, add respectively the cerium chloride of 8g, the chromium trioxide of 36g, 2g sodium dodecylbenzene sulfonate is dissolved in water, then adds the trioxide of 12g Dialuminum, 38g of boron nitride, stir to form a slurry, then dissolve 4g of oxalic acid in water and add, water is not included in the composition, under normal pressure, stir, add heat at 85°C, react for 18h, and make cerium chloride form particles Uniform cerium oxalate, separated from solid and liquid, roasted at 1150°C for 7 hours, cooled, and crushed by airflow to obtain silicon nitride ceramic polishing powder, the particle size of the obtained silicon nitride ceramic polishing powder is in the range of 0.2-2.0 μm Inside.

Embodiment 3

[0028] A kind of preparation method of silicon nitride ceramic polishing powder, in reactor, add respectively the cerium chloride of 11g, the chromium trioxide of 28g, 4g sodium dodecylbenzene sulfonate is dissolved in water, then adds the trioxide of 10g Dialuminum, 41g of boron nitride, stir to form a slurry, then dissolve 6g of oxalic acid in water and add, water is not included in the components, under normal pressure, stir, add heat at 85°C, react for 22h, and make cerium chloride form particles Uniform cerium oxalate, separated from solid and liquid, roasted at 1130°C for 8h, cooled, and crushed by air flow to obtain silicon nitride ceramic polishing powder, the particle size of the obtained silicon nitride ceramic polishing powder is in the range of 0.2 to 2.0 μm Inside.

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Abstract

The invention discloses a preparation method of silicon nitride ceramic polishing powder, which is characterized in that the method has the following process steps: in a reactor, 8% to 11% of cerium chloride is added according to the mass percentage concentration, and 28% to 38 % chromium trioxide, 2%~5% sodium dodecylbenzene sulfonate dissolved in water, then add 10%~20% aluminum oxide, 32%~45% boron nitride, stir to form a slurry, Dissolve 3%~8% oxalic acid in water and then add it. The sum of each component is 100%. Cerium oxalate with uniform particles is separated from solid and liquid, roasted at 1100°C~1150°C for 5~8h, cooled, and crushed by air flow to obtain silicon nitride ceramic polishing powder. The polishing powder has high grinding hardness, good powder polishing effect, high gloss, no scratches, high flatness, and less powder consumption.

Description

technical field [0001] The invention relates to the technical field of preparation of polishing powder, in particular to a preparation process of silicon nitride ceramic polishing powder and its use in silicon nitride ceramic polishing. Background technique [0002] Silicon nitride is a compound synthesized under artificial conditions. Although silicon nitride was directly synthesized more than 140 years ago, it was only remembered as a stable "refractory" nitride at that time. After World War II, with the rapid development of science and technology, materials with high temperature resistance, high hardness, high strength and corrosion resistance are urgently needed. After long-term efforts, silicon nitride was not paid attention to until 1955, and silicon nitride ceramic products with high quality, low cost and wide range of important uses were really produced in the mid-1970s. [0003] Silicon nitride is very strong, especially hot-pressed silicon nitride, which is one o...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C09G1/02
CPCC09G1/02
Inventor 李慧芝庄海燕孙旦子
Owner UNIV OF JINAN
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