Process unit and method for absorbing formaldehyde in polymethoxy dimethyl ether synthesis
A polymethoxydimethyl ether and process device technology, applied in chemical instruments and methods, chemical recovery, preparation of organic compounds, etc., can solve the problems of formaldehyde polymerization or disproportionation, low formaldehyde solubility, etc. Avoid the effects of self-polymerization and disproportionation reactions
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0021] Below in conjunction with accompanying drawing and specific embodiment, further illustrate the present invention, should be understood that these embodiments are only for illustrating the present invention and are not intended to limit the scope of the present invention, after having read the present invention, those skilled in the art will understand various aspects of the present invention Modifications in equivalent forms all fall within the scope defined by the appended claims of this application.
[0022] This process selects PODE2, an intermediate component dimer of polyoxymethylene dimethyl ether with a higher boiling point. The boiling point of PODE2 is 105°C, and the amount of dissolved formaldehyde is much higher than that of methylal. It can completely solve the problem of formaldehyde gas phase not being absorbed and then polymerized. Formaldehyde and methylal are synthesized to obtain the chemical reaction process of polyoxymethylene dimethyl ether as foll...
PUM
Property | Measurement | Unit |
---|---|---|
boiling point | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com