Preparation method for micropattern film with selective stimulation recovery function

A micro-pattern and selective technology, applied in the directions of micro-structure technology, micro-structure device, manufacturing micro-structure device, etc., can solve the problems of application limitation, non-selectivity of shape recovery parts, etc., to achieve simple preparation process and controllability and selectable and maneuverable effects

Active Publication Date: 2015-09-09
HARBIN INST OF TECH
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

However, due to the non-selectivity of its shape recovery part, the application of this type of material is very limited.

Method used

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  • Preparation method for micropattern film with selective stimulation recovery function
  • Preparation method for micropattern film with selective stimulation recovery function

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Experimental program
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specific Embodiment approach 1

[0016] Specific implementation mode 1: This implementation mode is a method for preparing a micropatterned thin film with selective stimulus recovery function, which is specifically carried out according to the following steps:

[0017] 1. Isolation of silicon wafers: four rectangular silicon wafers with micropatterns on the surface are glued horizontally on the same glass sheet with 502 glue, and the four silicon wafers with micropatterns on the surface are closely adjacent to form a rectangle I, and then use poly The tetrafluoroethylene film separates four closely adjacent rectangular silicon wafers with micropatterns on the surface from each other and also surrounds the surrounding area of ​​rectangle I. For the four rectangular silicon wafers with micropatterns on the surface of rectangle I, proceed clockwise The directions are respectively set as silicon wafer 1, silicon wafer 2, silicon wafer 3 and silicon wafer 4; the length×width×thickness of the four rectangular silico...

specific Embodiment approach 2

[0025] Embodiment 2: The difference between this embodiment and Embodiment 1 is that the shape memory polymer described in step 2 is styrene solution or epoxy resin. Others are the same as in the first embodiment.

specific Embodiment approach 3

[0026] Embodiment 3: The difference between this embodiment and Embodiment 2 is that the viscosity of the styrene solution at room temperature is 583.3 cP. Others are the same as in the second embodiment.

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Abstract

The invention relates to a preparation method for a micropattern film with a selective stimulation recovery function, aiming at solving the technical problem that the application of the micropattern is quite limited as the recovery position of a conventional shape memory micropattern is not selective. The preparation method comprises a first step of isolating a silicon wafer; a second step of dripping a shape memory polymer and curing; and a third step of stripping and flattening. The preparation method has the advantages that the shape memory micropattern film with the selective stimulation recovery function prepared with the sticky and thick shape memory polymer as a matrix can be stimulated by multiple manners, and has the characteristic that only the micropattern of a corresponding position can recover under different stimulation conditions. Through adoption of the preparation method, the controllability and selectivity of recovery positions are realized, and the preparation method is simple, has strong operability, and is conducive to application of the shape memory polymer material in multiple fields like aerospace, optical zoom, password transmission, sensors and so on.

Description

technical field [0001] The invention relates to a preparation method of a micropattern thin film with stimulation recovery function. Background technique [0002] Micropatterns have a wide range of applications in some fields, such as: electronics, biosensors, physics and other fields. The shape memory micropattern has attracted extensive attention from scholars due to its recoverable topology. It has a series of excellent properties such as shape recoverability and easy driving, and is ideal for preparing special devices such as dynamic grating structures and sensors. Material. However, due to the non-selectivity of the shape recovery part, the application of this kind of material is very limited. Therefore, it is very meaningful to prepare shape memory micropatterns with multiple stimuli and selective recovery properties, and shape memory micropatterns with selective stimulus recovery functions have a very wide application potential. Compared with traditional shape memor...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B81C1/00
Inventor 冷劲松李文兵刘彦菊
Owner HARBIN INST OF TECH
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