LPP-EUV light source system based on collosol jet target
A technology of LPP-EUV and sol jet target, applied in the field of LPP-EUV light source system, can solve the problems of increasing the difficulty of LPP-EUV light source control and maintenance, unfavorable efficient and stable operation of EUV lithography system, etc., so as to improve the operation stability Effect
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[0016] The following examples and drawings illustrate the present invention further, but the protection scope of the present invention should not be limited by this.
[0017] See first figure 1 , figure 1 It is a schematic diagram of the structure of the LPP-EUV light source system based on the sol jet target of the present invention. by figure 1 It can be seen that the composition of the LPP-EUV light source system based on the sol jet target of the present invention includes a sol generating device 1, a sol jet-circulating device 2, a pump laser source 3 and an LPP-EUV generating device 4. The sol M1 is generated by the sol generating device 1, and the sol jet target is formed in the LPP-EUV generating device 4 through the sol jet-circulating device 2. The pump laser source 3 outputs the pump laser L1, enters the LPP-EUV generating device 4, and then acts on the sol jet target.
[0018] See figure 2 , figure 2 It is a schematic diagram of the structure of the sol generating de...
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