Apparatus and methods for processing substrates

A technology for substrates and equipment, applied in the field of processing coated substrates, can solve problems such as unsealing, consumption, interruption, etc., and achieve the effects of low input cost and maintenance cost, small wear, and avoidance of loading corrosive substances

Active Publication Date: 2019-02-26
(CNBM) BENGBU DESIGN & RES INST FOR GLASS IND CO LTD
View PDF10 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

For this reason, the input costs for this process step take up a not insignificant share of the total input costs of a solar plant
Furthermore, it has been shown in practice that these technically complex and comparatively expensive components suffer from significant increases due to transport of coated substrates or process boxes, heating to high maximum temperatures of more than 500° C. and due to corrosive process atmospheres. wear and may become leaky
In the event of a failure, the complete assembly line is interrupted by required maintenance work

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Apparatus and methods for processing substrates
  • Apparatus and methods for processing substrates
  • Apparatus and methods for processing substrates

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0110] exist Figures 1 to 5A A process box oriented horizontally in a typical working position is illustrated in -5F. It is understood that the treatment tank can also be oriented differently and that the positions and orientations stated in the following description refer only to the illustration of the treatment tank in the figures, and this is not to be understood as limiting.

[0111] first observe figure 1 and 2 , which shows a generalized cross-sectional view of a processing box 1 for processing a coated substrate 2 ( figure 1 ) and a perspective view of such a treatment box 1 with an end-side closure part 9 ( figure 2 ).

[0112] The treatment box 1 is used for the treatment of substrates 2 coated on one side, for example for the thermal treatment of precursor layers for conversion into compound semiconductors, in particular chalcopyrite compounds. Although only a single substrate 2 is shown, the processing box 1 can equally be used for processing two or more sub...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
heightaaaaaaaaaa
thicknessaaaaaaaaaa
Login to view more

Abstract

The invention relates to an apparatus for processing coated substrates, characterized in that at least one evacuatable processing box for accommodating at least one substrate has a hermetically closable enclosure forming a hollow cavity, wherein the housing comprises at least one housing segment configured such that the substrate can be thermally treated by impinging electromagnetic heat radiation, wherein the housing has at least one housing segment couplable with a cooling device for cooling thereof and At least one housing segment not coupled to a cooling device, wherein the cavity is divided by at least one separating wall into a processing space and an intermediate space for accommodating the substrate, wherein the separating wall has one or more openings and is arranged on the substrate and between the casing segment coupled with the cooling device, and wherein the casing is equipped with at least one gas sleeve leading to the cavity, which can be closed for evacuating and introducing gas into the cavity; for the process box Cooling device for cooling the housing segment which can be coupled with the cooling device; at least one loading / unloading unit for loading and / or unloading the process chamber; at least one heating unit for heating the substrate in the process chamber; At least one cooling unit for cooling the substrate in the processing cabinet; at least one suction device for suctioning the cavity of the processing cabinet; at least one for feeding at least one gas to the cavity of the processing cabinet at least one transport mechanism configured to effect a relative movement between the process tank on the one hand and the heating unit, cooling unit and loading / unloading unit on the other.

Description

technical field [0001] The present invention relates to apparatus and methods for processing coated substrates in a processing chamber. Background technique [0002] Photovoltaic layer systems for the direct conversion of sunlight into electrical energy are well known. These photovoltaic layer systems are generally referred to as “solar cells”, where the term “thin-film solar cells” refers to layer systems with small thicknesses of only a few micrometers, which require a substrate for sufficient mechanical strength. Known substrates include mineral glass, plastics (polymers) or metals, especially metal alloys, and can be designed as rigid plates or flexible films, depending on the respective layer thickness and specific material properties. [0003] Thin-film solar cells with absorbers made of compound semiconductors have proven to be advantageous in terms of process maneuverability and efficiency. Thin-film solar cells have been described several times in the patent liter...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): H01L21/673H01L21/677H01L21/67
CPCH01L21/67173H01L21/67353H01L21/67393H01L21/6776Y02E10/541H01L21/67098C23C16/458H01L31/206
Inventor S.乔斯特M.费范格J.帕姆
Owner (CNBM) BENGBU DESIGN & RES INST FOR GLASS IND CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products