Vertical recycling and air sealing device for immersion type photoetching machine

Abstract

The invention discloses a vertical recycling and air sealing device for an immersion type photoetching machine. A central conical hole is formed in a base body of an immersion unit; a vertical air liquid recycling cavity and an air injection cavity are formed in the bottom surface of the immersion unit; a horizontal liquid injection opening, a horizontal liquid recycling opening, an air injection opening and a vertical air liquid recycling opening are formed in the base body of the immersion unit; a central through hole is formed in the lower end cover of the immersion unit; a vertical air liquid recycling hole slot and an air sealing hole slot are formed in the top surface of the lower end cover of the immersion unit; vertical air liquid recycling holes are formed in the vertical air liquid recycling hole slot; air sealing holes are formed in the air sealing hole slot; a certain micro hole is positioned on a perpendicular bisector of two closest micro holes in the adjacent vertical recycling holes. The vertical recycling and air sealing device can finish the sealing function for a gap flow field in the immersion type photoetching machine; the boundary of the flow field of immersion liquid is restrained by recycling negative pressure for vertical recycling and air flow for air sealing, so that leakage of the immersion liquid is avoided in a high-speed running process of the photoetching machine.

Description

technical field [0001] The invention relates to a flow field sealing device, in particular to a vertical recovery and air sealing device for an immersion photolithography machine. Background technique [0002] The lithography machine is one of the core equipment for manufacturing VLSI. The modern lithography machine is mainly based on optical lithography. It uses the optical system to accurately project and expose the pattern on the mask to the silicon coated with photoresist. Chip. It includes a laser light source, an optical system, a projection mask composed of chip patterns, an alignment system and a silicon wafer coated with photosensitive photoresist. [0003] The immersion lithography (Immersion Lithography) equipment fills a liquid with a high refractive index between the last projection objective lens group and the silicon wafer, which improves the numerical aperture of the projection objective lens compared to the dry lithography machine in which the intermediate ...

AI Technical Summary

Problems solved by technology

However, there are the following shortcomings: the liquid sealing method has very strict requirements on the sealing liquid. While ensuring the sealing performance requirements, it must also ensure that the sealing liquid and the filling liquid do not dissolve each other, and do not interact with the photoresist (or Topcoat) and the filling liquid. diffusion

During the high-speed movement of the substrate, once the outside air or sealing liquid is involved or dissolved or diffused into the filling liquid, it will have a negative impact on the exposure quality

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