Double-degree-of-freedom active vibration reducing device and control method

A technology of active vibration reduction and control method, which is applied in vibration dampers, photolithographic process exposure devices, shock absorbers, etc., can solve problems such as damage, reduced service life, and difficult to change parameters, so as to improve accuracy and reduce dynamic performance. the effect of ensuring the image quality

Active Publication Date: 2015-11-04
SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD +1
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Problems solved by technology

These vibration damping systems are simple in structure and easy to implement. The disadvantage is that once the design is completed, its parameters are difficult to change, so it can only attenuate the vibration of a specific narrow frequency band. It is not suitable for occasions with strong denaturation; at the same time, due to the limitation of stability, passive vibration isolation cannot attenuate low-frequency vibrations
Although a flexible hinge structure is a

Method used

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[0026] The dual-degree-of-freedom active damping device and control method of the present invention will be described in more detail below in conjunction with schematic diagrams, wherein a preferred embodiment of the present invention is shown, it should be understood that those skilled in the art can modify the present invention described here, and still The advantageous effects of the present invention are realized. Therefore, the following description should be understood as the broad knowledge of those skilled in the art, but not as a limitation of the present invention.

[0027] In the interest of clarity, not all features of an actual implementation are described. In the following description, well-known functions and constructions are not described in detail since they would obscure the invention with unnecessary detail. It should be appreciated that in the development of any actual embodiment, numerous implementation details must be worked out to achieve the developer...

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Abstract

The invention provides a double-degree-of-freedom active vibration reducing device and a control method; a flexible structure can decouple vibrations in vertical and horizontal directions, and uses a vibration reducing control algorithm for realizing active vibration reducing control to achieve the vibration requirement of nanoscale machining equipment; the mechanism using the active vibration reducing device and the control algorithm can achieve a vibration reducing effect with the vibration amplitude of 10-20 dB; the influence of the vibration on the dynamic performance of a lithography machine is preferably reduced; the imaging quality of a projection objective lens is guaranteed; and the precision of a photolithography process is improved.

Description

technical field [0001] The invention relates to the field of integrated circuit manufacturing, in particular to a dual-degree-of-freedom active damping device and a control method. Background technique [0002] With the development of large-scale integrated circuit manufacturing, nano-processing equipment represented by lithography machines integrates cutting-edge technologies in multiple disciplines such as optics, mechanics, and electricity, and represents the highest achievement of advanced manufacturing technology. Since nano-processing equipment represented by lithography machines involves nano-exposure, positioning and measurement, it has strict requirements on environmental control of vibration, temperature, humidity and particles, and vibration reduction technology is one of the key technologies. Early lithography machines and precision processing equipment used passive vibration reduction systems. The vibration reduction components include metal springs, rubber and ...

Claims

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Application Information

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IPC IPC(8): F16F7/00G03F7/20
CPCF16F7/00G03F7/20
Inventor 郭鹏黄静莉朱岳彬袁志扬
Owner SHANGHAI MICRO ELECTRONICS EQUIP (GRP) CO LTD
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