Silicon-based low-leakage-current cantilever grid MOSFET NOR gate
A technology of field effect transistors and cantilever beams, which is applied in the field of micro-electromechanical systems, can solve problems such as chip overheating, chip life reduction, and affecting chip stability, and achieve the effects of reducing gate DC leakage current and power consumption
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[0014] The silicon-based low-leakage current cantilever grid MOSFET NOR gate of the present invention is mainly composed of two cantilever grid NMOS transistors, that is, the first NMOS transistor 1 and the second NMOS transistor 2, and a load resistor 3 with a suitable resistance value. The sources of the NMOS transistors are connected together to the common ground, and the drains of the two NMOS transistors are also connected together and then connected to the load resistor 3. The resistance of the load resistor 3 is determined by the resistance of the NMOS transistors in the on or off state. The voltage division ratio of the power supply voltage further determines whether the output is high level or low level, and the load resistor 3 is connected to the power supply voltage. The two input signals are respectively input on the gates of the two NMOS transistors, and the output signal is output between the drains of the two NMOS transistors and the load resistor 3; the lead 4 i...
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