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Independent-type multi-source confocal ultrasonic atomization pyrolysis spraying reaction chamber

A technology of ultrasonic atomization and reaction chamber, applied in spray booths, coatings, spraying devices, etc., can solve the problems of single atomization source, easy cross contamination, poor repeatability of process parameters, uncontrollable film composition, etc., to improve film formation Efficiency, facilitates deposition and formation, and prevents the effect of polluting droplets

Active Publication Date: 2015-11-18
CHONGQING UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] The technical problem to be solved by the present invention is to provide a self-contained multi-source confocal ultrasonic atomization pyrolysis spraying reaction chamber to overcome the defects of the traditional single atomization source that is easy to cross-contaminate, poor repeatability of process parameters, and uncontrollable film composition

Method used

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  • Independent-type multi-source confocal ultrasonic atomization pyrolysis spraying reaction chamber
  • Independent-type multi-source confocal ultrasonic atomization pyrolysis spraying reaction chamber

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Embodiment Construction

[0028] Below in conjunction with accompanying drawing and embodiment the present invention will be further described:

[0029] Such as figure 1 , 2 As shown, an independent multi-source confocal ultrasonic atomization pyrolysis spraying reaction chamber is mainly composed of a reaction chamber 1, an atomization source 2, a spray tube 3, a sample carrier 4, a rotating rod 5, a motor 6, and a motor bracket 7 , upper cover 8, heating body shell 9, heating body 10, drive assembly, exhaust gas cover 14, exhaust gas extraction pipe 15, mounting bracket 16, fixing frame 17, heat reflection cover 18, lower fixing column 19, water cooling heat shielding plate 20, the upper fixed column 21, the water inlet pipe 22 and the water outlet pipe 23 constitute. Wherein, a group of atomization sources 2 is provided under the reaction chamber 1 , the number of the atomization sources 2 is at least two, and these atomization sources 2 are independent from each other and arranged along the circu...

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Abstract

The invention discloses an independent-type multi-source confocal ultrasonic atomization pyrolysis spraying reaction chamber. A sample bearing table is arranged in the reaction chamber, a heating body shell is arranged on the upper portion of the sample bearing table, and heating bodies are arranged in the heating body shell; at least two atomization sources are mutually independent and are arranged in the circumferential direction of the reaction chamber, and a spraying nozzle on the upper portion of each atomization source is connected with a spraying pipe; the upper portions of the spraying pipes both face the axis line of the reaction chamber and both form a spraying angle alpha with the axis line of the reaction chamber; and a nozzle at the upper portion of each spraying pipe is provided with a baffle, and the baffles can block or open the spraying nozzles at the upper ends of the corresponding spraying pipes. By means of the independent-type multi-source confocal ultrasonic atomization pyrolysis spraying reaction chamber, a thin film containing required components can be obtained, and the defect of cross contamination caused by a traditional structure is overcome; and high-temperature reaction tail gas near the sample bearing table is hooded through a tail gas pumping hood, heat reflection can be achieved through a heat reflection hood, and cooling is further achieved through a water-cooling heat shield plate.

Description

technical field [0001] The invention belongs to the field of ultrasonic atomization pyrolysis spraying film material preparation, in particular to an independent multi-source confocal ultrasonic atomization pyrolysis spraying reaction chamber. Background technique [0002] Ultrasonic atomization pyrolytic spraying (USP for short) is a common thin film material preparation process, which is widely used in scientific research and production. This method is good at the preparation of compound thin films such as oxides, sulfides, and chlorides. Under reasonable process parameters, the quality of USP film can be comparable to that of film materials prepared by sputtering and CVD methods, but the cost is greatly reduced. [0003] Doped thin films and multilayer thin films are very common in the research and production of thin film materials. The traditional USP method has certain problems in the preparation of doped and multilayer films. The main problem is that there is only one ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B05B15/12B05B17/06B05B12/14B05B13/02B05B15/04B05B15/00
CPCB05B12/1472B05B12/36B05B13/0278B05B13/0285B05B14/40B05B15/00B05B16/20B05B17/06
Inventor 龚恒翔刘星廖杰
Owner CHONGQING UNIV OF TECH
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