A Fast Recognition Method of Two-Dimensional Graphics in Optical Proximity Correction

A technology of two-dimensional graphics and recognition methods, which is applied in the fields of optics, originals for photomechanical processing, and photoplate-making process on patterned surfaces. Improved effect
CN105068374BActive Publication Date: 2019-07-23SHANGHAI HUAHONG GRACE SEMICON MFG CORP
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
SHANGHAI HUAHONG GRACE SEMICON MFG CORP
Publication Date
2019-07-23

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Abstract

A fast two-dimensional graph recognition method in OPC (optical proximity correction) comprises steps as follows: a series of normal-direction sampling points are formed on the edge of a graph, and optical strength of the normal-direction sampling points is acquired with a fast convolution algorithm; the normal-direction sampling points are subjected to cubic spline fitting according to the optical strength of the normal-direction sampling points, the optical boundary is estimated according to a critical value of optical strength reaction in an optical model, and a first difference is calculated at the optical boundary of the graph so as to estimate a slope of the edge of the graph; a series of tangential-direction sampling points are formed on the edge of the graph, and the optical strength of tangential sampling points for sampling is acquired with the fast convolution algorithm; the difference value of optical strength of each tangential sampling point and the optical strength of a reference point is calculated, and tangential drift is estimated according to the difference value and the slope; two-dimensional bending estimation is executed according to the optical boundary estimated in the optical boundary estimation step as well as the tangential boundary drift.
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Description

technical field

[0001] The present invention relates to the field of OPC (Optical Proximity Correction, optical proximity correction), and more specifically, the present invention relates to a method for fast recognition of two-dimensional graphics in optical proximity correction. Background technique

[0002] In the photolithography process, the final pattern on the wafer is determined by the intensity distribution of the light and the chemical reaction of the photoresist. Due to the different two-dimensional bending of the pattern, the contact area with the photoacid in the photoresist is different, resulting in a difference in the final imaging. In OPC modeling and simulation, further corrections should be made to different two-dimensional graphics to improve accuracy.

[0003] According to the prior art, it is generally possible to classify two-dimensional graphics according to the degree of prominence of the graphics, but the fineness of classification is poor, and it ...

Claims

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