A Fast Recognition Method of Two-Dimensional Graphics in Optical Proximity Correction

A technology of two-dimensional graphics and recognition methods, which is applied in the fields of optics, originals for photomechanical processing, and photoplate-making process on patterned surfaces. Improved effect

CN105068374BActive Publication Date: 2019-07-23SHANGHAI HUAHONG GRACE SEMICON MFG CORP
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Publication Date
2019-07-23

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Abstract

A fast two-dimensional graph recognition method in OPC (optical proximity correction) comprises steps as follows: a series of normal-direction sampling points are formed on the edge of a graph, and optical strength of the normal-direction sampling points is acquired with a fast convolution algorithm; the normal-direction sampling points are subjected to cubic spline fitting according to the optical strength of the normal-direction sampling points, the optical boundary is estimated according to a critical value of optical strength reaction in an optical model, and a first difference is calculated at the optical boundary of the graph so as to estimate a slope of the edge of the graph; a series of tangential-direction sampling points are formed on the edge of the graph, and the optical strength of tangential sampling points for sampling is acquired with the fast convolution algorithm; the difference value of optical strength of each tangential sampling point and the optical strength of a reference point is calculated, and tangential drift is estimated according to the difference value and the slope; two-dimensional bending estimation is executed according to the optical boundary estimated in the optical boundary estimation step as well as the tangential boundary drift.
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Description

technical field

[0001] The present invention relates to the field of OPC (Optical Proximity Correction, optical proximity correction), and more specifically, the present invention relates to a method for fast recognition of two-dimensional graphics in optical proximity correction. Background technique

[0002] In the photolithography process, the final pattern on the wafer is determined by the intensity distribution of the light and the chemical reaction of the photoresist. Due to the different two-dimensional bending of the pattern, the contact area with the photoacid in the photoresist is different, resulting in a difference in the final imaging. In OPC modeling and simulation, further corrections should be made to different two-dimensional graphics to improve accuracy.

[0003] According to the prior art, it is generally possible to classify two-dimensional graphics according to the degree of prominence of the graphics, but the fineness of classification is poor, and it ...

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Embodiment Construction

[0022] In order to make the content of the present invention clearer and easier to understand, the content of the present invention will be described in detail below in conjunction with specific embodiments and accompanying drawings.

[0023] figure 1 It schematically shows a flow chart of a method for fast recognition of two-dimensional graphics in optical proximity correction according to a preferred embodiment of the present invention.

[0024] like figure 1 As shown, the two-dimensional graphic rapid recognition method in the optical proximity correction according to the preferred embodiment of the present invention includes:

[0025] Optical intensity normal sampling step S1: place a series of sampling points in the normal direction on the graphic edge of the wafer (preferably, the spacing of the sampling points in the normal direction is 10-20nm; and preferably, the number of sampling points in the normal direction 7-15), and use the fast convolution algorithm to obtai...