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Making method of nuclear track etching membrane

A technology of nuclear track etching and manufacturing method, applied in chemical instruments and methods, membrane technology, semi-permeable membrane separation, etc., can solve problems such as being unsuitable for mass production, difficult to single-cone micropore diameter D1, difficult to operate, etc. , to achieve the effect of easy implementation, low cost and simple process

Inactive Publication Date: 2015-12-23
CHINA INSTITUTE OF ATOMIC ENERGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This method has the following disadvantages: 1. It is not easy to implement the diameters D1 and D2 of the single tapered microhole; 2. Due to the need to isolate the two etching solutions, it is difficult to operate and can only be produced in a small amount in the laboratory, which is not suitable for mass production.

Method used

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  • Making method of nuclear track etching membrane
  • Making method of nuclear track etching membrane
  • Making method of nuclear track etching membrane

Examples

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Embodiment 1

[0028] This embodiment is used to illustrate the manufacturing method of the nuclear track etching film provided by the present invention. Specific steps are as follows:

[0029] Irradiation: A polypropylene film with a thickness of 35 μm is selected as the base film, and a sulfide ion beam with an energy of 120-500 MeV is generated on the tandem accelerator of the China Institute of Atomic Energy, and the beam intensity is 0.1nA-1mA, which is radiated on the base film , the irradiation time is 0.1-0.8 seconds, so that the latent tracks generated by the irradiation penetrate the polymer base film, and the latent track density formed on the base film after irradiation is 1×10 5 / cm 2 ;

[0030] Coating anti-etching coating: coating anti-etching ink (Taiwan Chuan Yu, model: PR3000) on one side of base film after irradiation, the thickness of the anti-etching ink coating that makes is 5 μm;

[0031] Etching: put the base film coated with an anti-etching coating in H2 with a co...

Embodiment 2

[0037] This embodiment is used to illustrate the manufacturing method of the nuclear track etching film provided by the present invention. Specific steps are as follows:

[0038] Irradiation: Use a polyethylene terephthalate (PET) film with a thickness of 25 μm as the base film, and generate a sulfur ion beam with an energy of 120-500 MeV on the tandem accelerator of the China Institute of Atomic Energy. 0.1nA ~ 1mA, radiate on the base film, the irradiation time is 0.1 ~ 0.8 seconds, so that the latent track generated by the irradiation runs through the polymer base film, and the latent track density formed on the base film after irradiation is 1× 10 5 / cm 2 ;

[0039] Apply anti-etching coating: one side of base film after irradiation is coated with anti-etching glue (Rentong, model: S-338), the thickness of the anti-etching glue coating that makes is 3 μ m;

[0040] Etching: put the base film coated with an anti-etching coating in a NaOH solution with a concentration of...

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Abstract

The invention relates to a making method of a nuclear track etching membrane, and the making method comprises the following steps: irradiating, namely irradiating a polymer film by using fission fragments produced by energetic ions or reactors produced by an accelerator; coating an anti-etching coating, namely coating an anti-etching coating on one side of the polymer film; etching, namely immersing the irradiated polymer film in an etching solution I for etching; removing the anti-etching coating, namely removing anti-etching material on the surface of the polymer film etched in the etching solution I; and drying, namely drying the etched polymer film. The making method is simple in process, easy to implement and low in cost; the method can be adopted to produce a singer-taper cellular nuclear track etching membrane with small pore end section circle diameter (D1) of 0.1-15 micrometers and large pore end section circle diameter (D2) of 0.2-20 micrometers.

Description

technical field [0001] The invention belongs to the technical field of nuclear track etching films, and in particular relates to a manufacturing method of nuclear track etching films. Background technique [0002] Nuclear track etching membrane is a high-quality microporous membrane produced by nuclear technology. Its micropores are approximately cylindrical straight through holes with uniform pore size. It is an ideal filter membrane for precision filtration and sieving of particles. The filtration mechanism is sieving filtration. It is reusable, has strong pressure bearing capacity, high temperature resistance, good chemical and biological stability, and is currently the best precision filter material. . At present, it has been widely used in electronics, food, chemical, pharmaceutical and other industries and fields such as biology, medicine, environment, analysis and detection, and has a very broad application prospect. [0003] Generally, nuclear track-etched membrane...

Claims

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Application Information

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IPC IPC(8): B01D71/06B01D69/02B01D67/00
Inventor 梁海英吴振东焦学胜陈东风鞠薇傅元勇王雪杰
Owner CHINA INSTITUTE OF ATOMIC ENERGY
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