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Photosensitive resin composition and uses thereof

A photosensitive resin and composition technology, applied in optics, optical filters, opto-mechanical equipment, etc., can solve the problems of unacceptable roughness in the industry and shrinkage of black matrix films.

Inactive Publication Date: 2015-12-23
CHI MEI CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Although in the prior art, the photosensitive resin composition that has increased the amount of black pigment used can increase light-shielding properties, etc., however, after the photosensitive resin composition of each of the above-mentioned prior art solutions is post-baked, the black matrix produces serious film shrinkage, And its roughness is not acceptable to the industry

Method used

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  • Photosensitive resin composition and uses thereof
  • Photosensitive resin composition and uses thereof
  • Photosensitive resin composition and uses thereof

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0200] The preparation method of the photosensitive resin composition of the present invention is not particularly limited. For example, the black pigment (E) can be directly added into the photosensitive resin composition to disperse, or a part of the black pigment (E) can be dispersed in the In a part of the medium (medium) containing the alkali-soluble resin (A) and the solvent (D), after the pigment dispersion liquid is formed, it is combined with the compound (F) represented by the formula (a) and the compound (F) represented by the formula (b) having a fluorene skeleton The epoxy resin (G), the photoinitiator (C) and the rest of the solvent (D) are mixed and prepared. The dispersing step of the above-mentioned black pigment (E) can be performed by mixing the above-mentioned components with a mixer such as a bead mill or a roll mill.

[0201] The present invention also provides a black matrix formed from the aforementioned photosensitive resin composition.

[0202] The b...

Synthetic example 1

[0219] Synthesis example 1: Production method of resin (A-1-1) having an unsaturated group

[0220] With 100 parts by weight of fluorene epoxy compound (model ESF-300, manufactured by Nippon Steel Chemical; epoxy equivalent 231), 30 parts by weight of acrylic acid, 0.3 parts by weight of benzyltriethylammonium chloride, 0.1 parts by weight of 2,6-di-tert-butyl-p-cresol and 130 parts by weight of propylene glycol methyl ether acetate were continuously added to a 500mL four-necked flask, and the feeding rate was controlled at 25 parts by weight / minute, and the temperature was maintained at 100°C to Within the range of 110° C., after 15 hours of reaction, a light yellow transparent mixed liquid with a solid content concentration of 50 wt % can be obtained.

[0221] Then, 100 parts by weight of the above-mentioned mixed solution was dissolved in 25 parts by weight of ethylene glycol ether acetate, while adding 6 parts by weight of tetrahydrophthalic anhydride and 13 parts by weigh...

Synthetic example 2

[0222] Synthesis example 2: Manufacturing method of resin (A-1-2) having an unsaturated group

[0223] With 100 parts by weight of fluorene epoxy compound (model ESF-300, manufactured by Nippon Steel Chemical; epoxy equivalent 231), 30 parts by weight of acrylic acid, 0.3 parts by weight of benzyltriethylammonium chloride, 0.1 parts by weight of 2,6-di-tert-butyl-p-cresol and 130 parts by weight of propylene glycol methyl ether acetate were continuously added to a 500mL four-necked flask, and the feeding rate was controlled at 25 parts by weight / minute, and the temperature was maintained at 100°C to Within the range of 110° C., after 15 hours of reaction, a light yellow transparent mixed liquid with a solid content concentration of 50 wt % can be obtained.

[0224] Next, 100 parts by weight of the above mixed solution was dissolved in 25 parts by weight of ethylene glycol ether acetate, and 13 parts by weight of benzophenone tetracarboxylic dianhydride was added at the same ti...

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Abstract

The invention relates to a photosensitive resin composition for a black matrix, a color filter formed by the black matrix, and a liquid crystal display element. The photosensitive resin composition comprises an alkali-soluble resin (A), a compound (B) containing an ethylenically unsaturated group, a photoinitiator (C), a solvent (D), a black pigment (E), a compound (F) represented by Formula (a) and an epoxy resin (G) containing a fluorene skeleton represented by Formula (b). The photosensitive resin composition for the black matrix has the advantage of reducing film shrinkage and reducing roughness.

Description

technical field [0001] The invention relates to a photosensitive resin composition for a black matrix, a color filter and a liquid crystal display element formed by using the black matrix. In particular, it provides a photosensitive resin composition for a black matrix that reduces film shrinkage and roughness, and a color filter and a liquid crystal display element formed by using the black matrix. Background technique [0002] In recent years, various liquid crystal display technologies have developed vigorously. In order to improve the contrast and display quality of current liquid crystal displays, black matrix. The above-mentioned black matrix can prevent problems such as a decrease in contrast and a decrease in color purity caused by light leakage between pixels. In the past, the materials used in the black matrix are mainly evaporated films containing chromium or chromium oxide. However, when the above-mentioned evaporated films are used as the material of the black...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/027G03F7/004G02F1/1335G02B5/20
Inventor 曾靖渊
Owner CHI MEI CORP