Liquid filter substrate

A liquid filter and substrate technology, applied in chemical instruments and methods, membrane, membrane technology, etc., can solve the problems of rising filtration pressure, unstable water permeability, unable to maintain porous structure, etc., to achieve stable liquid permeability , The effect of excellent liquid permeability and excellent capture performance

Active Publication Date: 2015-12-23
TEIJIN LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In addition, when a liquid filter is used for a long period of time, or in processes such as hot pressing (adhesion) when processing it into a filter, the following problems may occur: the polyolefin microporous membrane undergoes a pressure change more than necessary, The problem that the original porous structure cannot be maintained, and the water permeability becomes unstable; the problem that the filtration pressure is abnormally increased due to the closure of the pores, etc.

Method used

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  • Liquid filter substrate
  • Liquid filter substrate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0116] A polyethylene composition obtained by mixing 14 parts by mass of ultrahigh molecular weight polyethylene (PE1) having a mass average molecular weight of 4.6 million and 6 parts by mass of high density polyethylene (PE2) having a mass average molecular weight of 560,000 was used. A polyethylene solution was prepared by mixing with a previously prepared mixed solvent of 55 parts by mass of liquid paraffin and 25 parts by mass of decalin (decalin) so that the concentration of the total amount of polyethylene resin would be 20% by mass.

[0117] The polyethylene solution was extruded from a die in a sheet form at a temperature of 160° C., and while cooling the extrudate in a water bath at 25° C., a water flow was set on the surface of the water bath, thereby A gel-like sheet (base tape) was prepared while the mixed solvent discharged from the gelled sheet in the water bath and suspended on the water surface did not reattach to the sheet. The base tape was dried at 55°C for...

Embodiment 2

[0122] In Example 1, polyethylene obtained by mixing 12 parts by mass of ultra-high molecular weight polyethylene (PE1) with a mass average molecular weight of 4.6 million and 8 parts by mass of high density polyethylene (PE2) with a mass average molecular weight of 560,000 was used. Except for the composition, a polyolefin microporous membrane was obtained in the same manner as in Example 1.

[0123] The obtained polyolefin microporous membrane has excellent trapping performance (the trapping rate of polystyrene particles with a particle diameter of 30nm is more than 80%), and has excellent water permeability and liquid delivery stability (the rate of change of water permeability 15% or less).

Embodiment 3

[0125] In Example 1, the polyolefin microporous membrane was obtained in the same manner as in Example 1 except that the heat treatment (heat setting) temperature after biaxial stretching was set to 134°C.

[0126] The obtained polyolefin microporous membrane has excellent trapping performance (the trapping rate of polystyrene particles with a particle diameter of 30nm is more than 80%), and has excellent water permeability and liquid delivery stability (the rate of change of water permeability 15% or less).

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Abstract

This liquid filter substrate comprises a polyolefin microporous film, the water permeation performance of the polyolefin microporous film being 0.51-1.20 ml/min.cm2, the bubble point of the polyolefin microporous film being 0.45-0.70 MPa inclusive, and the bulk compressibility of the polyolefin microporous film being less than 15%.

Description

technical field [0001] The present invention relates to a substrate for liquid filters. Background technique [0002] In recent years, the miniaturization and high performance of electronic equipment have been progressing day by day. In particular, digital equipment and mobile terminals represented by personal computers and smartphones are making great progress. As we all know, technological innovation in the semiconductor industry has played a major role in various technologies leading and supporting this progress. In the semiconductor industry in recent years, in terms of wiring pattern size, there has been a trend of development competition in the field of less than 20nm, and companies are rushing to establish state-of-the-art production lines. [0003] A photolithography (lithography) process is a process of forming a pattern in the manufacture of a semiconductor component. With the miniaturization of patterns in recent years, not only the properties of the chemical so...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01D71/26B01D69/02C08J9/00C08J9/26
CPCB01D67/0027B01D67/0032B01D69/10B01D2325/22B01D2325/24B01D2325/30B01D71/26B01D69/02B01D2325/02B01D2325/04B01D2325/20B01D67/003C08J9/00C08J9/26
Inventor 大野隆央古谷幸治
Owner TEIJIN LTD
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