Wheat high-photosynthetic-efficiency anti-adversity production-increasing regulator and preparation method and application thereof

Abstract

The invention relates to a wheat high-photosynthetic-efficiency anti-adversity production-increasing regulator and a preparation method and application thereof. The regulator per liter comprises 5-20 g of 5-aminolevulinic acid, 7-10 g of naphthylacetic acid salt, 5-10 g of spreader and the balance water. The spreader is one or more of polysorbate 20 and polysorbate 60. The regulator can obviously enhance the capability of wheat for resisting low temperature, chilling damage, high temperature and low light stress, the number of productive ear, kernels per spike and thousand seed weight of wheat are increased, and the wheat yield is improved by more than 10%. Meanwhile, the wheat high-photosynthetic-efficiency anti-adversity production-increasing regulator has the advantages of being low in cost, convenient to use, small in field residual and the like, is easy to apply and popularize and has the positive promoting effect on wheat production in China.

Description

technical field [0001] The invention relates to a plant growth regulator, in particular to a wheat high-light-efficiency anti-adversity yield-increasing regulator and a preparation method and application thereof. Background technique [0002] Wheat is one of the main food crops in my country. It is an important commodity grain and strategic reserve grain in my country. It is also the main ration of people in the north. It is mainly distributed in the Huanghuaihai Plain, the middle and lower reaches of the Yangtze River Plain and the inland areas of Northwest China. The annual planting area is 364 million mu. The total output is 115 million tons, accounting for 22.08% of my country's grain planting area, ranking first in the world. For a long time, natural disasters have been frequent in major wheat cropping areas in my country, such as: low temperature chilling damage, continuous rain, waterlogging, weak light and other stresses in rice-wheat rotation cropping areas, which af...

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Problems solved by technology

Among them, the cultivation technology measures include: selection of resistant varieties, precision planting, rational irrigation, nitrogen fertilizer transfer, etc., to a certain extent, can reduce the damage caused by low temperature and cold damage, rainy waterlogging; however, for high temperature drought and drought Hot wind stress, as well as the hazards of continuous rain and insufficient light have little effect

At present, in production, foliar fertilizers such as potassium dihydrogen phosphate and fulvic acid, and plant growth regulators such as chlormequat and paclobutrazol are mostly sprayed on the leaves to improve the stress resistance and lodging resistance of wheat. However, due to the long half-life of paclobutrazol (PP333, clobutazole), the long-term use causes excessive residues in the field, which not only seriously affects the emergence of subsequent crops, but also the residue of paclobutrazol in wheat The amount exceeds the standard and does not meet the standards of food processing, resulting in a reduction in processing quality

Secondly, spraying chlormequat on the leaves can control the development of wheat organs and delay the growth and development period, resulting in excessive greenness and late maturity of wheat, which seriously reduces yield

Potassium dihydrogen phosphate and fulvic acid have unstable effects

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