Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Machining method of double-face touch screen shadow eliminating conducting glass

A technology of conductive glass and a processing method, which is applied in the processing field of double-sided touch screen erasing conductive glass, can solve problems such as affecting electromagnetic shielding, electrostatic protection function, and viewing pattern effects, and achieves high uniformity, good electromagnetic shielding, and low cost. Effect

Inactive Publication Date: 2016-01-13
LUOYANG KANGYAO ELECTRONICS
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

During the production process, it is easy to etch away parts that should not be etched, and there are traces of circuit etching, which affect its electromagnetic shielding and electrostatic protection functions. The existing traces of etch will affect the viewing pattern

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Machining method of double-face touch screen shadow eliminating conducting glass

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] Both surfaces of the upper glass substrate 1 and the lower glass substrate 7 are the tin surface 2 and the air surface 3, the air surfaces 3 of the upper glass substrate 1 and the lower glass substrate 7 are correspondingly bonded, and the tin surface 2 of the upper glass substrate 1 is set Upper interference layer one 4, upper transparent passivation layer 5 is set between upper interference layer one 4 and upper interference layer two 6, lower interference layer one 8 is set under the tin surface 2 of lower glass substrate 7, lower interference layer one 8 is connected to lower interference layer two A lower transparent passivation layer 9 is arranged between the interference layer 2 10;

[0028] Both the upper transparent passivation layer 5 and the lower transparent passivation layer 9 are made of transparent silicon dioxide or transparent silicon oxynitride;

[0029] The first upper interference layer 4 , the second upper interference layer 6 , the first lower inte...

Embodiment 2

[0031] In the first step, the upper glass substrate 1 and the lower glass substrate 7 are processed,

[0032] A. Cutting the upper glass substrate 1 and the lower glass substrate 7, first X cutting, then Y cutting, and then breaking into pieces;

[0033] B. Perform edging and chamfering on the cut upper glass substrate 1 and lower glass substrate 7, first X edging, then chamfering, rotate 90° and then Y edging and chamfering;

[0034] C. Scrub and dry;

[0035] D, polishing the upper glass substrate 1 and the lower glass substrate 7 after edging and chamfering;

[0036] E, then brush and dry;

[0037] In the second step, the upper interference layer 1 and the lower glass substrate 7 are sputtered with an upper interference layer 4, an upper transparent passivation layer 5, a lower interference layer 8, and a lower transparent passivation layer 9;

[0038] A. After polishing, brushing and drying, the upper glass substrate 1 and the lower glass substrate 7 are bonded together...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a machining method of double-face touch screen shadow eliminating conducting glass. The machining method includes the steps that firstly, an upper glass substrate and a lower glass substrate are treated; secondly, a first upper interference layer, an upper transparent passivation layer, a first lower interference layer and a lower transparent passivation layer are sputtered on the upper glass substrate and the lower glass substrate; thirdly, a second upper interference layer and a second lower interference layer are sputtered on the upper transparent passivation layer and the lower transparent passivation layer sputtered on the upper glass substrate and the lower glass substrate. The good electromagnetic shielding, electrostatic protection and shadow elimination effects are achieved, existing traditional conducting glass can be completely replaced, and the conducting glass which is low in energy consumption, high in uniformity and low in cost and is used for manufacturing a capacitance screen is provided for downstream clients.

Description

technical field [0001] The invention relates to the technical field of conductive glass, in particular to a method for processing the shadow-eliminating conductive glass for a double-sided touch screen. Background technique [0002] At present, capacitive screen products are widely used, and the double-sided conductive glass in the capacitive screen is its main component. The conductive film coated with conductive glass on both sides has relatively strict performance requirements, such as uniformity, heat resistance, acid and alkali resistance. Performance, high temperature and high humidity resistance, etc.; when making transparent circuits, due to the increased process difficulty, acid engraved circuits are often used when making circuits. During the production process, it is easy to etch away parts that should not be etched, and there are traces of circuit etching, which affect its electromagnetic shielding and electrostatic protection functions, and the existing traces o...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): C03C27/06C03C17/34
Inventor 谭华秦遵红王恋贵董安光
Owner LUOYANG KANGYAO ELECTRONICS
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products