A kind of preparation method of superhydrophobic elastomer
An elastomer and super-hydrophobic technology, which is applied in the field of preparation of super-hydrophobic elastomers, can solve problems such as easy peeling of coatings, cumbersome preparation methods, and threats to human health, achieving good adhesion, little harm to human body and environment, and improved The effect of hydrophobicity
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Embodiment 1
[0027] Step 1: SiO 2 Modified by KH580:
[0028] Mix 10ml deionized water and 90ml ethanol, adjust the pH to 3 with acetic acid, add 1g SiO 2 (average particle diameter: 12 nm), ultrasonic dispersion was carried out to obtain a dispersion liquid. Add 0.1 g of KH580 to the dispersion liquid, raise the temperature to 80°C and react for 8 hours. Centrifugal washing and drying to obtain KH580 modified SiO 2 ;
[0029] Step 2: SiO 2 Surface modification of vinyl POSS:
[0030] KH580 modified SiO 2 Disperse in 500ml tetrahydrofuran, ultrasonically disperse for 2 hours, after obtaining the dispersion, add 0.5g vinyl POSS and 0.01g benzophenone, under ultraviolet light (the light source is a 500W high pressure mercury lamp, the wavelength is between 320nm and 420nm) Stir the reaction for 0.5 hours, and obtain SiO grafted with vinyl POSS after centrifugal drying 2 ;
[0031] Step 3: Dissolve 1g of styrene-butadiene rubber and 0.01g of benzophenone in 10ml of tetrahydrofuran, i...
Embodiment 2
[0034] Step 1: SiO 2 Modified by KH580:
[0035] Mix 10ml deionized water and 90ml ethanol, adjust the pH to 4 with acetic acid, add 1g SiO 2 (average particle diameter: 14 nm), ultrasonic dispersion was carried out to obtain a dispersion liquid. Add 0.2g of KH580 to the dispersion liquid, raise the temperature to 75°C and react for 6 hours. Centrifugal washing and drying to obtain KH580 modified SiO 2 ;
[0036] Step 2: SiO 2 Surface modification of vinyl POSS:
[0037] KH580 modified SiO 2Disperse in 500ml tetrahydrofuran, ultrasonically disperse for 2 hours, after obtaining the dispersion liquid, add 0.8g vinyl POSS and 0.02g 2-methyl-1-[4-(methylthio)phenyl]-2-(4-mol Linyl)-1-acetone, stirred and reacted for 0.5 hours under ultraviolet light (the light source is a 500W high-pressure mercury lamp, the wavelength is between 320nm and 420nm), and obtained SiO grafted with vinyl POSS after centrifugal drying 2 ;
[0038] Step 3: Dissolve 1g of styrene-butadiene rubber...
Embodiment 3
[0041] Step 1: SiO 2 Modified by KH580:
[0042] Mix 10ml of deionized water and 90ml of ethanol, adjust the pH to 5 with acetic acid, add 1g of SiO 2 (average particle diameter: 500 nm), ultrasonic dispersion was carried out to obtain a dispersion liquid. Add 0.05g of KH580 to the dispersion liquid, raise the temperature to 60°C and react for 4 hours. Centrifugal washing and drying to obtain KH580 modified SiO 2 ;
[0043] Step 2: SiO 2 Surface modification of vinyl POSS:
[0044] KH580 modified SiO 2 Disperse in 500ml tetrahydrofuran, ultrasonically disperse for 2 hours, after obtaining the dispersion liquid, add 0.5g vinyl POSS and 0.01g 1-hydroxycyclohexyl benzophenone, under ultraviolet light (light source is 500W high-pressure mercury lamp, wavelength between 320nm and 420nm Between) under stirring reaction 0.5 hour, obtain the SiO of grafted vinyl POSS after centrifugal drying 2 ;
[0045] Step 3: Dissolve 1g of methyl vinyl silicone rubber and 0.01g of 1-hydro...
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