Aluminum or aluminium alloy and copper vacuum diffusion welding method
A technology of vacuum diffusion and welding method, which is applied in the direction of welding equipment, welding/welding/cutting items, non-electric welding equipment, etc. It can solve the problems of hindering the wetting of the base metal and the combination of the interface, reducing the comprehensive performance of the joint, and achieving industrialization. Production, enhanced contact wetting and interdiffusion, simple method effects
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specific Embodiment approach 1
[0017] Specific embodiment 1: The vacuum diffusion welding method of aluminum or aluminum alloy and copper described in this embodiment is specifically performed according to the following steps:
[0018] 1. Mechanically clean the aluminum or aluminum alloy parts to be welded, and then place them in an acetone solution for ultrasonic cleaning for 10 to 30 minutes to obtain the cleaned aluminum or aluminum alloy; mechanically clean the copper parts to be welded, and then place them in the acetone solution Ultrasonic cleaning for 10 minutes to 30 minutes to obtain cleaned copper;
[0019] 2. Place the cleaned aluminum or aluminum alloy in a plasma-enhanced chemical vapor deposition vacuum device and evacuate to a pressure of 10 -3 Below Pa, feed hydrogen gas at a gas flow rate of 20sccm~60sccm, adjust the vacuum speed to control the pressure in the plasma enhanced chemical vapor deposition vacuum device to 100Pa~300Pa, and raise the temperature to 100Pa~300Pa under hydrogen atmosphere...
specific Embodiment approach 2
[0027] Specific embodiment two: this embodiment is different from specific embodiment one in that in step two, the cleaned aluminum is placed in a plasma enhanced chemical vapor deposition vacuum device and evacuated to a pressure of 10 -3 Below Pa, hydrogen gas is introduced at a gas flow of 30 sccm, the vacuum speed is adjusted to control the pressure in the plasma enhanced chemical vapor deposition vacuum device to 250 Pa, and the temperature is raised to 200°C under a pressure of 250 Pa and a hydrogen atmosphere. Others are the same as the first embodiment.
specific Embodiment approach 3
[0028] Specific embodiment three: This embodiment is different from one of specific embodiments one or two in that: in step two, the cleaned aluminum is placed in a plasma enhanced chemical vapor deposition vacuum device and evacuated to a pressure of 10 -3 Below Pa, hydrogen gas was introduced at a gas flow rate of 50 sccm, the vacuum speed was adjusted to control the pressure in the plasma enhanced chemical vapor deposition vacuum device to 250 Pa, and the temperature was raised to 300°C under a pressure of 250 Pa and a hydrogen atmosphere. Others are the same as the first or second embodiment.
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Abstract
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